Maskless Exposure Apparatus Light Source Control for Fine Resolution
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing maskless exposing methods and plotters face challenges in achieving fine resolution while maintaining high exposing speed, as the distance between neighboring spots to be exposed is often shorter than the step size covered by the relative movement of the substrate or object, leading to inefficiencies in light irradiation and plotting processes.
Innovation Solution
The exposing apparatus and method control the turning-on of specific light sources among multiple light sources arranged along the direction of relative movement, allowing for 'thinning exposure' to irradiate spots with intervals shorter than the step size, by calculating the optimal frame rate and light source intervals to ensure efficient light distribution and maintain desired resolution and speed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the substrate moves at a predetermined speed with respect to the light source during exposure, then the exposing speed and productivity are improved, but the resolution between neighboring spots deteriorates when the step size is longer than the distance between spots
Solution Approach 1:
The patent applies periodic action by controlling the light source to be turned on and off at specific timings corresponding to the periodic movement of the substrate. The light source is activated only when a spot passes through the illumination position, creating a periodic exposure pattern that matches the substrate movement cycle. This allows the substrate to move at higher speeds while maintaining precise spot spacing, as the light is delivered in synchronized periodic pulses rather than continuously.
Solution Approach 2:
The patent implements preliminary action by calculating and determining in advance which specific light sources should be turned on at specific timings based on the substrate movement speed and spot interval. The control unit pre-determines the activation schedule for each light source along the movement direction, ensuring that the correct spots are exposed at the correct times before the substrate actually passes under them. This preliminary planning allows high-speed movement while maintaining precise resolution.
2Productivity
If multiple light sources are used to irradiate spots along the movement direction, then the exposing speed is improved, but the power consumption and energy use increase
Solution Approach 1:
The patent applies local quality by turning on only the specific light sources that correspond to the spots requiring exposure at each moment, rather than illuminating the entire substrate continuously. Each light source along the movement direction is activated locally and temporarily only when its corresponding spot passes through the illumination position. This localized, temporary illumination significantly reduces total power consumption while maintaining high exposing speed through the coordinated action of multiple light sources.
Solution Approach 2:
The light sources operate in a periodic manner, being turned on and off in synchronization with the substrate movement and spot interval. Each light source remains off most of the time and activates only during brief periodic intervals when its corresponding spot is positioned for exposure. This periodic operation pattern reduces average power consumption compared to continuous illumination, while the cumulative effect of multiple light sources maintaining high exposing speed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables efficient light irradiation and plotting with fine resolution and high speed by optimizing the turning-on of light sources, reducing the power required for exposure and maintaining productivity, applicable to both exposing apparatus and plotters like ink-jet plotters.
Implementation Method 1
a light source P and control means for controlling the turning-on of the light source P at a specific timing so that spots are irradiated with light from the light source P
Data Source
AI summary
An exposing apparatus for irradiating desired spots on a substrate to be exposed relatively moving with respect to two or more light sources arranged along the direction of the relative movement to form a desired exposure pattern using the light sources comprises a control means for controlling the turning-on of only specific light sources out of the two or more light sources at a specific timing.