Memory Cell Liner Layer for Thermal Isolation
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Solution Overview
Problem
In memory devices, heat loss and thermal disturbance between adjacent memory cells lead to increased set and reset currents and reliability issues, especially as devices become more integrated, causing operational errors and reduced performance.
Innovation Solution
The implementation of a memory device structure with a liner layer contacting adjacent memory cells and a flowable insulating material with low thermal conductivity to minimize heat loss and transfer between cells, enhancing the operating characteristics and reducing defects in the fabrication process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If memory devices are highly integrated to reduce size, then device miniaturization is achieved, but heat loss and thermal disturbance between adjacent memory cells increase
Solution Approach 1:
The patent divides the memory cell structure into separated components with insulating material filling the spaces between adjacent cells. This segmentation prevents thermal coupling between cells, reducing heat loss and thermal disturbance while maintaining high integration density.
Solution Approach 2:
The patent introduces insulating material as an intermediary substance between adjacent memory cells. This intermediary layer blocks heat transfer pathways, preventing thermal disturbance between cells while allowing the cells to remain in close proximity for high integration.
2Volume of moving object
If memory devices are highly integrated to reduce size, then device miniaturization is achieved, but thermal disturbance between adjacent memory cells increases
Solution Approach 1:
The patent divides the memory cell structure into separated components with insulating material filling the spaces between adjacent cells. This segmentation prevents thermal coupling between cells, reducing heat loss and thermal disturbance while maintaining high integration density.
Solution Approach 2:
The patent introduces insulating material as an intermediary substance between adjacent memory cells. This intermediary layer blocks heat transfer pathways, preventing thermal disturbance between cells while allowing the cells to remain in close proximity for high integration.
3Loss of energy
If liner layer is formed over protruding upper portions of memory cells, then heat transfer between cells is reduced, but fabrication complexity increases
Solution Approach 1:
The patent performs preliminary formation of the liner layer over the protruding upper portions of memory cells before filling insulating material in the spaces between cells. This preliminary action simplifies the overall fabrication process by establishing the thermal isolation structure early, preventing heat transfer before it becomes a problem in subsequent processing steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces heat loss and thermal disturbances, improving the reliability and performance of memory devices by minimizing heat transfer between cells and optimizing the fabrication process.
Implementation Method 1
a flowable insulating material with low thermal conductivity to minimize heat loss and transfer between cells
Data Source
AI summary
An electronic device includes a semiconductor memory. A method for fabricating the electronic device includes forming a first memory cell extending vertically from a surface of substrate and having a first upper portion that protrudes laterally, forming a second memory cell extending vertically from the surface of the substrate and having a second upper portion that protrudes laterally towards the first upper portion, and forming a liner layer over the first and second memory cells, the liner layer having a first portion disposed over the first upper portion and a second portion disposed over the second upper portion, the first and second portions of the liner layer contacting each other.


