Mesa Sidewall Modification in Nanoimprint Lithography Templates
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Solution Overview
Problem
In nanoimprint lithography, extrusions often form on the sidewalls of templates, causing damage and defects during subsequent imprinting steps, and existing methods to remove these extrusions can damage the patterning surface.
Innovation Solution
A system and method that modifies the mesa sidewalls of a template by exposing them to a reactive gas within a controlled gap, using a platter to protect the patterning surface, allowing for the removal of extrusions or application of a nonwetting coating to prevent their formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If existing methods are used to remove extrusions from mesa sidewalls, then extrusions are removed, but the patterning surface is damaged
Solution Approach 1:
The patent applies different treatments to different parts of the template: the mesa sidewalls are exposed to reactive gas for modification while the patterning surface is protected by the platter. This localized treatment allows extrusions to be removed or prevented on sidewalls without affecting the patterning surface quality.
Solution Approach 2:
The platter serves as an intermediary protective element that physically blocks the reactive gas from reaching the patterning surface while allowing the gas to modify the mesa sidewalls. This mediator enables selective modification of only the desired areas.
2Object-generated harmful factors
If mesa sidewalls are modified to prevent extrusions, then extrusion formation is reduced, but the patterning surface may be affected by the modification process
Solution Approach 1:
The modification process is localized to the mesa sidewalls through physical protection of the patterning surface by the platter. The reactive gas only contacts the sidewalls that need modification, leaving the patterning surface untouched and preserving its integrity.
Solution Approach 2:
The patterning surface is protected in advance by positioning the platter before the modification process begins. This preliminary protective action ensures that subsequent reactive gas exposure cannot damage the patterning surface.
3Reliability
If the template is processed frequently to maintain sidewall quality, then extrusions are prevented, but productivity is reduced due to additional processing time
Solution Approach 1:
The mesa sidewalls are modified in advance before the imprinting process begins. This preliminary modification prevents extrusion formation during subsequent imprinting steps, eliminating the need for frequent intermediate processing and maintaining high productivity.
Solution Approach 2:
The reactive gas modification creates a lasting effect on the mesa sidewalls that continues to prevent extrusions throughout the imprinting process. This continuous protection eliminates interruptions and maintains steady-state productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents extrusions from forming or removes them without damaging the patterning surface, improving the productivity and throughput of the nanoimprint lithography process by maintaining the integrity of the template's surface chemistry.
Implementation Method 1
exposing them to a reactive gas within a controlled gap
Implementation Method 2
using a platter to protect the patterning surface
Data Source
AI summary
An apparatus, method, or platter for modifying mesa sidewalls of a template by cleaning or coating the mesa sidewalls. In which the template has a pattern area on a first surface of a mesa. Mesa sidewalls surround the first surface of the mesa. The mesa sidewalls are exposed to a gas. The gas modifies the mesa sidewalls. Resistance to the flow of gas towards the pattern area is provided.