Micro Side Correction Calculation for Semiconductor Pattern Precision

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Solution Overview

Problem

Conventional apparatuses are unable to calculate a proper correction amount for each of two or more continuous micro sides in a pattern figure, particularly when these sides are small enough to satisfy a predetermined condition, leading to potential shape deformation during pattern correction processes.

Innovation Solution

A pattern correction amount calculating apparatus that includes an accepting unit for pattern information, a micro side group acquiring unit, a virtual side acquiring unit, a virtual side correction amount calculating unit, and a micro side correction amount calculating unit, which together enable the calculation of proper correction amounts for each micro side by approximating virtual sides and using trigonometric functions to divide correction amounts into components based on angles relative to these virtual sides.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If conventional apparatuses are used for pattern correction, then the correction process can be performed, but it is not possible to calculate a proper correction amount for each of two or more continuous micro sides

Engineering Contradiction:

Improvecorrection amount calculation accuracyVSAvoidcapability to handle continuous micro sides

Core Design Contradiction:

Measurement precisionVSAdaptability or versatility

Solution Approach 1:

The patent segments the continuous micro sides into individual sides by calculating correction amounts for each side separately. The contour is divided into multiple sides, and for each side, the apparatus determines whether it is a micro side and calculates its correction amount individually, rather than treating the entire continuous sequence as a single unit.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The patent introduces a new dimension of classification by determining whether each side is a micro side based on predetermined conditions. This creates a binary classification dimension (micro side vs. non-micro side) that enables differentiated correction amount calculations for different side types within the same contour.

Inventive Principle:

Principle #17Another dimension (Dimensionality change)

2Measurement precision

If micro sides are corrected individually without approximation, then calculation precision improves, but computational complexity increases significantly

Engineering Contradiction:

Improvecorrection amount precisionVSAvoidcalculation process complexity

Core Design Contradiction:

Measurement precisionVSDevice complexity

Solution Approach 1:

The patent applies local quality by determining different correction calculation methods for different parts of the contour. For micro sides, one calculation approach is used, while for non-micro sides, a different approach is applied. This localized differentiation maintains precision where needed while simplifying calculations where appropriate.

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The patent changes the calculation parameters based on side characteristics. By determining whether each side is a micro side and selecting appropriate correction amount calculation methods accordingly, the system adapts its computational parameters to match the local geometric characteristics, optimizing both precision and complexity.

Inventive Principle:

Principle #35Parameter changes

3Productivity

If conventional correction methods are applied to micro sides, then processing speed is maintained, but shape deformation occurs in the pattern figure

Engineering Contradiction:

Improvecorrection processing speedVSAvoidpattern figure shape accuracy

Core Design Contradiction:

ProductivityVSShape

Solution Approach 1:

The patent performs preliminary classification of sides to identify micro sides before the correction calculation process. By determining which sides are micro sides in advance and preparing appropriate correction methods for them, the system prevents shape deformation from occurring during the correction process, while maintaining efficient processing through pre-planned calculation approaches.

Inventive Principle:

Principle #9Preliminary anti-action

Data Source

PatentEP3211479B1Pattern correction amount calculating apparatus, pattern correction amount calculating method, and storage medium

Publication Date: 2022.05.04 NIPPON CONTROL SYST CORP

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AI summary

In order to solve a conventional problem that it is not possible to calculate a proper correction amount for each of two or more continuous micro sides, a pattern correction amount calculating apparatus includes: an accepting unit that accepts pattern information; a micro side group acquiring unit that acquires a micro side group, which is a group of two or more continuous sides forming a contour of a pattern figure indicated by the pattern information, and is a group of micro sides that are each small enough to satisfy a predetermined condition; a virtual side acquiring unit that acquires a virtual side, which is a side that approximates two or more micro sides contained in the micro side group; a virtual side correction amount calculating unit that calculates a virtual side correction amount, which is a correction amount for the virtual side; a micro side correction amount calculating unit that calculates two or more micro side correction amounts, which are correction amounts respectively for the two or more micro sides contained in the micro side group corresponding to the virtual side, using the virtual side correction amount; and an output unit that outputs the two or more micro side correction amounts. Accordingly, it is possible to calculate a proper correction amount for each of two or more continuous micro sides.