Variable Illumination Microscope Using Multi-Diaphragm Segmentation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current mask inspection microscopes face challenges in setting numerous different illumination settings in a simple and cost-effective manner, particularly due to the limitations of using single diaphragms to achieve complex intensity distributions required for accurate imaging in lithography processes.
Innovation Solution
The use of multiple diaphragms arranged sequentially or in parallel within the illumination beam path, combined with diaphragm plates and data processing systems, allows for the generation of various intensity distributions in the pupil plane, enabling a wide range of illumination settings that would be impossible with a single diaphragm, including 'top hat' profiles and softer transitions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple diaphragms are used to generate complex intensity distributions, then illumination settings versatility is improved, but device complexity increases
Solution Approach 1:
The illumination system is segmented into multiple diaphragms (first diaphragm, second diaphragm, third diaphragm) positioned at different pupil planes, allowing complex intensity distributions to be built from simpler individual diaphragm patterns. This segmentation enables versatile illumination settings while keeping each individual diaphragm relatively simple in design.
Solution Approach 2:
The patent introduces a third dimension by adding a second pupil plane with a second diaphragm, in addition to the conventional single pupil plane. This dimensional expansion allows independent control of intensity distribution at two different planes, dramatically increasing illumination setting versatility without requiring each individual diaphragm to be overly complex.
2Ease of manufacture
If axicons or diffractive optical elements are used to generate illumination settings, then illumination quality is improved, but manufacturing complexity and cost increase
Solution Approach 1:
The patent replaces expensive, difficult-to-manufacture axicons and diffractive optical elements with simpler, cheaper diaphragms that can be easily manufactured using standard techniques such as chromium deposition on glass or sheet metal fabrication. These diaphragms achieve the required illumination settings capability without the manufacturing complexity of alternative components.
Solution Approach 2:
Instead of using complex optical elements like axicons that directly shape the light, the patent uses diaphragms that create intensity distributions by blocking light in specific patterns. This copying approach—using simple geometric patterns rather than complex optical transformations—maintains illumination quality while dramatically simplifying manufacturing.
3Device complexity
If a single diaphragm is used to control illumination, then device simplicity is maintained, but the number of possible illumination settings is limited
Solution Approach 1:
The patent merges multiple diaphragms positioned at different pupil planes into a unified illumination control system. The first diaphragm at the first pupil plane, the second diaphragm at the second pupil plane, and the third diaphragm at the third pupil plane work together to generate complex intensity distributions that none could achieve alone, significantly expanding illumination settings while maintaining reasonable device complexity through modular design.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration significantly increases the number of possible illumination settings, allowing for precise adaptation to scanner requirements, enhancing imaging capabilities and cost-effectiveness by enabling the use of simpler diaphragm designs and automation for selecting optimal settings.
Implementation Method 1
a light source that emits projection light, at least one illumination beam path, and a first diaphragm for generating a resultant intensity distribution of the projection light in a pupil plane
Data Source
AI summary
A mask inspection microscope for variably setting the illumination. It serves for generating an image of the structure of a reticle arranged in an object plane in a field plane of the mask inspection microscope. It comprises a light source that emits projection light, at least one illumination beam path, and a first diaphragm for generating a resultant intensity distribution of the projection light in a pupil plane of the illumination beam path, that is optically conjugate with respect to the object plane. The mask inspection microscope has at least one further diaphragm for generating the resultant intensity distribution. The first diaphragm and the at least one further diaphragm influence the resultant intensity distribution of the projection light at least partly at different locations of the pupil plane.


