Microstructure-Enhanced Silicon Photodetectors for High Bandwidth

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Solution Overview

Problem

Conventional silicon photodetectors face limitations in detecting longer optical wavelengths due to low absorption efficiency, leading to restricted bandwidth and quantum efficiency, which is inadequate for modern telecommunications and data center applications.

Innovation Solution

The development of microstructure-enhanced photodetectors with semiconductor regions featuring pillars, holes, or voids that increase photon absorption by utilizing resonance, scattering, and interference effects, allowing for enhanced absorption across a broader wavelength range, including 850 nm and beyond.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the thickness of the absorption region is increased to improve quantum efficiency at longer wavelengths, then absorption efficiency is improved, but bandwidth is reduced

Engineering Contradiction:
Improvequantum efficiencyVSAvoidbandwidth
Core Design Contradiction:
ReliabilityVSSpeed

Solution Approach 1:

The absorption region is divided into multiple discrete microstructures (pillars, holes, or voids) arranged in an array. This segmentation increases the effective absorption path length through resonance and scattering effects while maintaining a compact overall thickness, thereby achieving high quantum efficiency without sacrificing bandwidth.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent transitions from a conventional planar absorption region to a three-dimensional microstructured array. By introducing vertical dimensionality with pillars or voids extending through the absorption region, the effective optical path length is increased without proportionally increasing the physical thickness, resolving the contradiction between absorption efficiency and bandwidth.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Ease of manufacture

If conventional silicon photodetectors are used for longer wavelengths, then manufacturing simplicity is maintained, but absorption efficiency deteriorates

Engineering Contradiction:
Improvemanufacturing simplicityVSAvoidabsorption efficiency
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent modifies the physical structure of the silicon absorption region by introducing microscale geometric features (pillars, holes, voids) with specific dimensions and spacing. These parameter changes enable resonance and scattering effects that dramatically improve absorption efficiency at longer wavelengths while maintaining compatibility with standard silicon fabrication processes.

Inventive Principle:
Principle #35Parameter changes

3Reliability

If microstructures are added to enhance absorption, then quantum efficiency is improved, but device complexity is increased

Engineering Contradiction:
Improvequantum efficiencyVSAvoidstructural complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent employs a porous or microstructured silicon layer with an array of pillars, holes, or voids. This porous structure increases the effective surface area and optical interaction length, enhancing quantum efficiency. The regular periodic arrangement of these microstructures allows for systematic fabrication using standard photolithography and etching techniques, managing device complexity.

Inventive Principle:
Principle #31Porous materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

These microstructure-enhanced photodetectors achieve higher quantum efficiency and bandwidth, exceeding 5 Gb/s at 850 nm with 60% efficiency and 10 Gb/s with 60% efficiency, while reducing capacitance, thus addressing the limitations of conventional silicon photodetectors.

Implementation Method 1

increase absorption of photons by utilizing resonance, scattering, and interference effects

Methodology Applied
Scientific EffectResonance: Resonance

Implementation Method 2

increase absorption of photons by utilizing resonance, scattering, and interference effects

Methodology Applied
Scientific EffectScattering: Scattering

Implementation Method 3

increase absorption of photons by utilizing resonance, scattering, and interference effects

Methodology Applied
Scientific EffectInterference: Interference

Implementation Method 4

absorbing region configured to absorb photons from a source signal

Methodology Applied
Scientific EffectPhotoelectric Effect: Photoelectric Effect

Data Source

PatentUS11309444B1Microstructure enhanced absorption photosensitive devices
Publication Date: 2022.04.19 W&WSENS DEVICES INC
  • US11309444B1 patent drawing
  • US11309444B1 patent drawing
  • US11309444B1 patent drawing

AI summary

Techniques for enhancing the absorption of photons in semiconductors with the use of microstructures are described. The microstructures, such as pillars and/or holes, effectively increase the effective absorption length resulting in a greater absorption of the photons. Using microstructures for absorption enhancement for silicon photodiodes and silicon avalanche photodiodes can result in bandwidths in excess of 10 Gb/s at photons with wavelengths of 850 nm, and with quantum efficiencies of approximately 90% or more.