Microwave Mask Cleaning for OLED Manufacturing

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Solution Overview

Problem

Conventional cleaning methods for masks in OLED manufacturing are inefficient, requiring long cleaning times, high-purity solutions, and often result in material residue, which hampers productivity and accuracy.

Innovation Solution

A microwave dry-type cleaning method and apparatus are used to pre-process the mask by heating and breaking up organic material films, followed by solution spraying, immersion cleaning, rinsing, and final microwave drying, significantly reducing cleaning time and residue while increasing efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of time

If wet-type immersion cleaning method is used, then cleaning is performed, but cleaning time is long and productivity is low

Engineering Contradiction:

Improvecleaning timeVSAvoidcleaning productivity

Core Design Contradiction:

Loss of timeVSProductivity

Solution Approach 1:

The patent applies preliminary action by using microwave heating before the wet cleaning step to pre-break down the organic material film on the mask. This preliminary treatment reduces the complexity and duration of the subsequent wet cleaning process, thereby reducing total cleaning time and improving productivity

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The patent replaces the traditional mechanical wet cleaning process with a combination of microwave heating and simplified solution spraying. The microwave energy directly breaks down the organic material through thermal and non-thermal effects, substituting the need for prolonged mechanical immersion cleaning

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

2Reliability

If wet-type immersion cleaning method is used, then organic material is removed, but material residue remains

Engineering Contradiction:

Improvecleaning effectivenessVSAvoidmask accuracy

Core Design Contradiction:

ReliabilityVSManufacturing precision

Solution Approach 1:

The patent changes the physical and chemical parameters of the cleaning process by using microwave heating to alter the state of organic material on the mask. The microwave energy causes thermal decomposition and changes in the organic material's physical state, making it easier to remove completely without residue that would affect mask accuracy

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent replaces traditional wet cleaning with microwave-based heating and simplified solution treatment. This substitution enables more complete removal of organic materials through microwave-induced breakdown, reducing material residue and improving mask accuracy for subsequent OLED manufacturing

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

3Productivity

If traditional cleaning process is used, then cleaning is performed, but cleaning efficiency is low

Engineering Contradiction:

Improvecleaning efficiencyVSAvoidcleaning period

Core Design Contradiction:

ProductivityVSLoss of time

Solution Approach 1:

The patent replaces the traditional multi-step mechanical wet cleaning system with a microwave heating and solution spraying system. The microwave energy rapidly breaks down organic materials through dielectric heating and thermal effects, dramatically reducing cleaning time and improving cleaning efficiency

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent applies preliminary microwave heating action before the final cleaning step to pre-process and break down organic material films. This preliminary treatment significantly reduces the time required for subsequent cleaning steps, thereby improving overall cleaning efficiency and reducing the cleaning period

Inventive Principle:

Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method and apparatus dramatically reduce organic material on masks before wet-type cleaning, shortening the cleaning period, enhancing productivity, and improving the overall efficiency of OLED display device manufacturing.

Implementation Method 1

heating the to-be-cleaned mask with microwave to break up the organic material film attached to the mask

Methodology Applied

Scientific EffectMicrowave heating: Dielectric Heating

Implementation Method 2

heating the to-be-cleaned mask with microwave to break up the organic material film attached to the mask

Methodology Applied

Scientific EffectThermal decomposition: Pyrolysis

Implementation Method 3

drying the rinsed mask with microwave

Methodology Applied

Scientific EffectMicrowave heating: Dielectric Heating

Data Source

PatentUS9724735B2Cleaning method and cleaning apparatus for a mask

Publication Date: 2017.08.08 TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD

AI summary

The present invention relates to a cleaning method and a cleaning apparatus for a mask. The cleaning method includes: step 1, providing a to-be-cleaned mask which is made of metal and has an organic material film attached thereto; step 2, heating the to-be-cleaned mask with microwave to break up the organic material film attached to the mask; step 3, stopping heating with microwave, and spraying the heated mask with a solution to remove off the broken organic material film from the mask; step 4, cleaning residual organic material film on the mask with a solution; step 5, rinsing the cleaned mask to wash off residual solution on the mask; step 6, drying the rinsed mask with microwave. Accordingly, the cleaning period of mask is dramatically shortened, the cleaning productivity is increased and the probability of material residue is decreased.