Microwave Phase Control for Plasma Mode Jump Suppression
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Solution Overview
Problem
The challenge in plasma processing is to suppress mode jump of plasma when using a large microwave transmitting member for multiple microwaves, which leads to discontinuous electron density and non-homogeneous processing of larger workpieces.
Innovation Solution
A plasma processing apparatus with phase adjustment parts and tuner parts in the microwave transmission paths, and a microwave introduction part with a conductive ceiling and slots, allows for controlled phase differences in microwaves introduced into the process container, preventing mode jump by ensuring uniform electric field distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a large microwave transmitting member is used for multiple microwaves, then the number of microwave introduction regions can be reduced, but mode jump of plasma is likely to occur due to discontinuous electron density
Solution Approach 1:
The microwave transmitting member is divided into multiple independent microwave introduction regions, each capable of introducing microwaves separately. This segmentation allows each region to maintain continuous electron density while collectively covering a large area, thus preventing mode jump while reducing the need for multiple separate transmitting members.
Solution Approach 2:
Each microwave introduction region is designed with specific local characteristics optimized for its position and function. The regions can have different geometries, sizes, and microwave transmission properties tailored to their local requirements, ensuring uniform plasma generation across the entire large area while maintaining continuous electron density in each local region.
2Area of stationary object
If the size of the microwave transmitting member is increased, then it can accommodate larger workpieces, but mode jump of plasma occurs due to discontinuous electron density
Solution Approach 1:
The large microwave transmitting member is segmented into multiple smaller microwave introduction regions distributed across the surface. Each segment independently generates plasma with continuous electron density, and the collective effect covers the entire large workpiece area, thus achieving both large area coverage and electron density continuity.
Solution Approach 2:
The system dynamically controls the microwave introduction in each region to ensure continuous plasma generation. By coordinating the microwave power and timing across multiple regions, the system maintains continuous electron density throughout the large processing area, preventing mode jump even as the workpiece size increases.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively suppresses mode jump, maintaining homogeneous plasma density and improving processing reliability for larger workpieces, such as semiconductor wafers.
Implementation Method 1
a microwave transmission part configured to transmit the microwaves outputted from the microwave output part into the process container via a plurality of transmission paths
Implementation Method 2
The microwave transmission part includes phase adjustment parts disposed in the respective transmission paths and configured to adjust phases of the microwaves
Implementation Method 3
tuner parts disposed in the respective transmission paths and configured to match impedance between the microwave output part and an interior of the process container
Implementation Method 4
a microwave introduction part configured to radiate the microwaves transmitted by the microwave transmission part inside the process container
Implementation Method 5
a microwave transmitting plate fitted to the recess of the conductive member and configured to transmit and introduce the microwaves radiated through the plurality of slots into the process container
Implementation Method 6
The present disclosure relates to a plasma processing apparatus and a plasma processing method for processing a workpiece with microwave plasma
Data Source
AI summary
There is provided a plasma processing apparatus including a microwave output part configured to generate microwaves and to distribute and output the microwaves to a plurality of paths, a microwave transmission part configured to transmit the microwaves outputted from the microwave output part into a process container via a plurality of transmission paths, and a control part configured to control the microwaves. The control part is configured to control the microwaves such that the phases of microwaves become different from each other when the microwaves transmitted via the transmission paths are introduced from a microwave transmitting plate for common use into the process container.


