Microwave Plasma Shower Plate Ignition for Low-Damage ALD
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Solution Overview
Problem
Existing plasma processing technologies face challenges in achieving high-quality film formation at low temperatures while minimizing electrical and physical damage to the film, particularly in the context of plasma atomic layer deposition (ALD) methods.
Innovation Solution
The proposed plasma processing apparatus incorporates a chamber with a microwave transmission window, a shower plate, and a protrusion that functions as a plasma ignition source. This configuration generates surface wave plasma using microwaves and improves plasma ignition performance by creating a high electric field region, thereby enhancing radical generation efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If radio-frequency waves are used for plasma generation in ALD method, then ease of operation is improved, but radical generation efficiency deteriorates
Solution Approach 1:
The patent changes the frequency parameter of electromagnetic waves from radio-frequency to microwave band, which increases radical generation efficiency while maintaining ease of operation through automated microwave plasma source control
Solution Approach 2:
The patent replaces radio-frequency electromagnetic field with microwave electromagnetic field, substituting one type of electromagnetic energy with another higher-frequency type to achieve improved radical generation while maintaining operational simplicity
2Quantity of substance
If microwaves are radiated to generate plasma, then radical generation efficiency is improved, but electrical damage to film may occur
Solution Approach 1:
The patent extracts and removes ions from the plasma through the shower plate, separating the harmful ionic component from the useful radical component, allowing high-power microwave plasma generation without film damage
Solution Approach 2:
The patent segments the plasma into two distinct regions: a plasma generation space with high radical density and a processing space with filtered plasma, using the shower plate as a separation boundary that allows radicals to pass while blocking ions
3Use of energy by moving object
If surface waves are confined in high-electric field region, then power absorption efficiency is improved, but device complexity increases
Solution Approach 1:
The shower plate performs multiple functions simultaneously: it grounds the microwave radiation surface, confines surface waves in the high-electric field region, and filters ions from radicals. This multi-functionality achieves high power absorption efficiency without adding device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus facilitates stable and efficient plasma ignition, reduces the likelihood of abnormal discharges, and improves radical generation efficiency, which is essential for high-quality film formation in ALD processes.
Implementation Method 1
a microwave supply configured to supply microwaves into the chamber via the microwave transmission window
Implementation Method 2
surface waves generated directly below a microwave radiation surface are confined in a space, which is a high-electric field region surrounded by the microwave radiation surface and the shower plate
Implementation Method 3
a high-electric field region surrounded by the microwave radiation surface and the shower plate
Implementation Method 4
a protrusion protruding from the shower plate into the plasma generation space and including a conductor in at least a portion of the protrusion
Data Source
AI summary
A plasma processing apparatus includes: a chamber; a stage provided in the chamber; a microwave transmission window provided on a wall surface of the chamber; a microwave supply configured to supply microwaves into the chamber via the microwave transmission window; a shower plate configured to partition an interior of the chamber into a plasma generation space, which is a region where the microwave transmission window is disposed, and a processing space, which is a region where the stage is disposed; and a protrusion protruding from the shower plate into the plasma generation space and including a conductor in at least a portion of the protrusion.