Microwave Plasma Distributor with Variable Ratio Control
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Solution Overview
Problem
In microwave plasma processing apparatuses, the distribution accuracy of microwaves to multiple waveguides is compromised due to reflected waves from the antenna, leading to deviations in the intended power ratio, which existing fixed distribution ratios cannot effectively correct.
Innovation Solution
A microwave plasma processing apparatus with a distributor using a variable distribution ratio, a monitor unit to track microwave power, and a distribution ratio control unit that adjusts the distribution ratio based on monitored power differences, along with phase shifters and isolators to manage phase and reflected waves, ensuring accurate microwave distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a fixed distribution ratio is used in the distributor, then the device complexity is reduced, but the distribution accuracy of microwaves to multiple waveguides deteriorates due to reflected waves from the antenna
Solution Approach 1:
The distributor is designed with variable distribution ratios that can be dynamically adjusted based on monitored microwave power levels. The distributor includes multiple waveguides with adjustable coupling coefficients, allowing the distribution ratio to be changed from fixed to variable to compensate for reflected waves and achieve accurate power distribution to each waveguide.
Solution Approach 2:
A monitor unit is installed to detect the actual microwave power distributed to each waveguide, and this information is fed back to a control unit. The control unit adjusts the distribution ratio of the distributor based on the feedback signal to maintain the desired power distribution despite reflected waves from the antenna, thereby resolving the accuracy issue.
2Manufacturing precision
If the distribution ratio is adjusted to compensate for power deviations, then the distribution accuracy is improved, but the device complexity increases due to additional control mechanisms
Solution Approach 1:
The system employs a monitor unit to detect actual microwave power levels in each waveguide and feeds this information back to a control unit. The control unit automatically adjusts the distribution ratio to maintain accurate power distribution, improving accuracy while keeping the control mechanism integrated and manageable rather than overly complex.
Solution Approach 2:
The distributor system is designed to self-adjust its distribution ratio based on monitored power levels. The monitor unit and control unit work together to automatically compensate for power deviations caused by reflected waves, reducing the need for external manual adjustment and simplifying the overall control architecture.
3Stability of the object's composition
If reflected waves from the antenna are present, then the plasma generation stability is maintained, but the microwave power ratio distribution deviates from the intended ratio
Solution Approach 1:
The monitor unit continuously monitors the actual microwave power distributed to each waveguide and provides feedback to the control unit. The control unit adjusts the distribution ratio in real-time to compensate for power deviations caused by reflected waves from the antenna, maintaining both plasma stability and accurate power distribution.
Solution Approach 2:
The system changes the distribution ratio parameter of the distributor based on monitored power levels. By dynamically adjusting this parameter, the system compensates for reflected waves and maintains the intended power ratio distribution while preserving plasma generation stability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution improves the distribution accuracy of microwaves to each waveguide, stabilizes plasma generation, and maintains uniform plasma distribution within the processing space by dynamically correcting distribution ratios and phase shifts.
Implementation Method 1
a microwave generator configured to generate microwaves for generating plasma of a processing gas introduced into a processing space
Implementation Method 2
the microwaves are radiated from a slot antenna into the processing container to ionize the processing gas within the processing container, thereby exciting the plasma
Data Source
AI summary
Disclosed is a microwave plasma processing apparatus including: a processing container configured to define a processing space a microwave generator configured to generate microwaves for generating plasma of a processing gas introduced into the processing space, a distributor configured to distribute the microwaves to a plurality of waveguides using a variable distribution ratio, an antenna installed in the processing container to seal the processing space and configured to radiate the microwaves distributed to each of the plurality of waveguides by the distributor to the processing space, a monitor unit configured to monitor a power of the microwaves distributed to each of the plurality of waveguides by the distributor, and a distribution ratio control unit configured to correct the distribution ratio used for distribution of the microwaves by the distributor based on a difference between a ratio of the power of the microwaves monitored by the monitor unit and a previously designated distribution ratio.