Molybdenum Bottom Electrode for Wakeup-Free Ferroelectric Memory

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Solution Overview

Problem

Ferroelectric random-access memory (FRAM) devices face challenges with oxygen vacancies or traps clustering in the ferroelectric structure, leading to non-uniformity and reduced manufacturing yields, as well as degradation of the memory window and reliability due to the need for a wakeup procedure.

Innovation Solution

The use of a molybdenum bottom electrode minimizes the formation of oxygen vacancies and traps, allowing for a larger memory window and more reliable read operations without the need for a wakeup procedure, thereby enhancing manufacturing yields and device reliability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional electrode materials are used, then the device can be manufactured, but oxygen vacancies and traps form in the ferroelectric structure leading to non-uniformity and reduced reliability

Engineering Contradiction:
Improvedevice reliabilityVSAvoidmanufacturing uniformity
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent changes the material parameter of the bottom electrode from conventional materials (platinum, titanium nitride, tantalum nitride) to molybdenum. This material substitution fundamentally alters the chemical reactivity parameters, creating a less reactive electrode that minimizes oxygen vacancy formation and trap states in the ferroelectric structure, thereby improving both reliability and manufacturing uniformity

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs a composite electrode structure where the bottom electrode is specifically designed as molybdenum or molybdenum-containing material. This composite approach combines the electrical conductivity requirements with reduced chemical reactivity toward the ferroelectric layer, solving the contradiction between manufacturability and device uniformity

Inventive Principle:
Principle #40Composite materials

2Reliability

If a wakeup procedure is implemented to address oxygen vacancies, then device operation can continue, but valuable space is occupied and device lifespan is degraded

Engineering Contradiction:
Improvedevice lifespanVSAvoidwakeup circuitry
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies preliminary action by selecting molybdenum as the bottom electrode material from the outset, which inherently prevents oxygen vacancy formation and eliminates the need for subsequent wakeup procedures. This preventive approach removes the requirement for additional wakeup circuitry, saving space and extending device lifespan without requiring corrective actions later

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent extracts and removes the wakeup circuitry component entirely by using a molybdenum bottom electrode that prevents oxygen vacancy formation. By eliminating the root cause (oxygen vacancies) through material selection, the corrective mechanism (wakeup procedure and its circuitry) becomes unnecessary and is removed from the device architecture

Inventive Principle:
Principle #2Taking out (Extraction)

3Ease of manufacture

If reactive electrode materials are used, then manufacturing costs may be lower, but oxygen vacancies and traps increase reducing manufacturing yields

Engineering Contradiction:
Improvemanufacturing costVSAvoidmanufacturing yield
Core Design Contradiction:
Ease of manufactureVSProductivity

Solution Approach 1:

The patent changes the material composition parameter of the bottom electrode to molybdenum, which offers an optimal balance between manufacturing cost and manufacturing yield. Molybdenum provides reduced chemical reactivity that minimizes oxygen vacancy formation, thereby improving manufacturing yield while maintaining cost-effectiveness compared to precious metals like platinum

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20230329001A1MFM device with an enhanced bottom electrode
Publication Date: 2023.10.12 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US20230329001A1 patent drawing
  • US20230329001A1 patent drawing
  • US20230329001A1 patent drawing

AI summary

The present disclosure relates to a ferroelectric memory device that includes a bottom electrode, a ferroelectric structure overlying the bottom electrode, and a top electrode overlying the ferroelectric structure where the bottom electrode includes molybdenum.