Monoalkyl Tin Purification for Low-Metal EUV Patterning Precursors
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Solution Overview
Problem
Existing semiconductor processing technologies face challenges in managing high-purity solutions with low particle and metal contamination to mitigate defects and enable effective radiation patterning for microelectronics applications.
Innovation Solution
Purification methods involving fractional distillation and advanced filtration techniques are employed to reduce metal and particulate contaminants in monoalkyl tin trialkoxides and triamides, achieving low parts-per-billion metal contamination and low particle counts, suitable for EUV lithography.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional processing methods are used to produce monoalkyl tin compositions, then production cost and simplicity are maintained, but metal contamination and particulate contamination remain high
Solution Approach 1:
The purification process is divided into multiple sequential stages: initial filtration to remove large particulates, fractional distillation to separate monoalkyl tin from polyalkyl tin based on boiling point differences, and final filtration through sub-micron filters. Each stage targets specific contaminants, progressively achieving the required purity levels of ≤10 ppb metal contamination and ≤100 particles/mL
Solution Approach 2:
The method performs preliminary purification actions during the synthesis and concentration steps, using controlled reaction conditions and initial filtration to remove obvious contaminants before the main fractional distillation process. This preliminary action reduces the burden on subsequent purification stages and prevents contamination accumulation
2Reliability
If high-purity monoalkyl tin compositions are produced through extensive purification, then pattern defects are reduced, but production time and cost increase
Solution Approach 1:
The method optimizes purification parameters including fractional distillation temperature gradients, pressure conditions, and filter pore sizes to achieve maximum contamination removal efficiency within reasonable processing time. By carefully controlling these parameters, the process achieves ≤10 ppb metal contamination and ≤100 particles/mL without excessive time investment
Solution Approach 2:
The method replaces time-consuming manual purification operations with automated fractional distillation systems and controlled filtration processes. This substitution maintains high purity standards while reducing overall processing time and improving consistency
3Manufacturing precision
If fractional distillation and filtration are used to reduce metal contamination to parts-per-billion levels, then particle counts decrease, but process complexity and equipment requirements increase
Solution Approach 1:
The method uses intermediary filtration steps with progressively finer filter media as intermediate stages between the main purification processes. These intermediary filters capture particulates that might interfere with or clog the final sub-micron filtration stage, protecting the equipment and maintaining flow rates
Solution Approach 2:
The method employs disposable filter cartridges and single-use distillation setups for critical purification stages. This approach eliminates the need for complex cleaning and validation procedures between batches, simplifying manufacturing while maintaining high purity standards
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The purified monoalkyl tin compositions provide effective EUV patterning with low patterned product failure rates and high yield, suitable for forming very fine structures in semiconductor manufacturing.
Implementation Method 1
performing fractional distillation of a monoalkyl tin trialkoxide or monoalkyl tin triamide with temperatures, pressures and equipment selected to collect the monoalkyl tin trialkoxide or monoalkyl tin triamide
Implementation Method 2
flowing the composition using an impeller style pump through a filter to remove particulate contaminants
Data Source
AI summary
The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.