MOSFET Drain Resistance Layout for Higher ESD Immunity

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Solution Overview

Problem

Advanced MOSFET and CMOS devices face challenges in electrostatic discharge (ESD) immunity, particularly during deep-submicron fabrication processes, where existing methods suffer from low epitaxy quality and ESD performance degradation.

Innovation Solution

A through substrate resistive component is connected in series with the drain terminal of a transistor, providing additional resistance to shield the drain from high-energy ESD pulses, utilizing a wafer stack with a back end-of-line fabrication process and a power delivery network to enhance ESD immunity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a large space is added between the drain metal contact and the gate edge to add resistance in series with the drain, then ESD immunity is improved, but epitaxy quality deteriorates leading to ESD performance degradation

Engineering Contradiction:
ImproveESD immunityVSAvoidepitaxy quality
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent transitions from a planar resistance structure to a vertical three-dimensional resistive component that extends through the substrate thickness. This vertical configuration adds resistance in series with the drain terminal while avoiding the epitaxy quality issues associated with large lateral spaces in deep-submicron fabrication processes.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The resistive component is formed as part of the substrate structure before final device assembly, pre-establishing the series resistance path that will protect against ESD events. This preliminary configuration ensures proper resistance values are achieved without compromising subsequent fabrication steps.

Inventive Principle:
Principle #10Preliminary action

2Reliability

If additional resistance is connected in series with the drain terminal to shield from high-energy ESD pulses, then ESD immunity is improved, but device complexity increases

Engineering Contradiction:
ImproveESD immunityVSAvoidstructure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The resistive component is merged with the substrate structure itself, combining the substrate's mechanical support function with the electrical resistance function. This integration eliminates the need for separate resistance components and reduces overall device complexity while maintaining ESD protection capabilities.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The substrate serves multiple functions: providing mechanical support, establishing electrical connections, and incorporating the resistive component for ESD protection. This multi-functionality reduces the total number of discrete components needed in the device structure.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution improves ESD immunity by allowing the drain to tolerate higher voltages and large hot carrier injections, with lower process impact and improved epitaxy control compared to prior approaches.

Implementation Method 1

a first contact terminal of the resistive component is connected to a drain terminal of a transistor... the resistive component provides an ESD immunity by enabling the drain of the transistor to tolerate higher voltages

Methodology Applied
Scientific EffectElectrical Resistance: Electrical Resistance

Data Source

PatentUS11862626B2High ESD immunity field-effect device and manufacturing method thereof
Publication Date: 2024.01.02 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US11862626B2 patent drawing
  • US11862626B2 patent drawing
  • US11862626B2 patent drawing

AI summary

An apparatus for providing electrostatic discharge (ESD) immunity and a method for fabricating the same are disclosed herein. The apparatus comprises a field effect transistor (FET) formed on a semiconductor substrate in a front-end-of-line (FEOL) layer during an FEOL process, a metal interconnect layer formed on top of the FEOL layer during a back-end-of-line (BEOL) process, wherein the metal interconnect layer comprises a plurality interconnects configured to interconnect the FET to a plurality of components formed on the semiconductor substrate, a power delivery network (PDN) formed under the semiconductor substrate in a backside layer during a backside back-end-of-line (B-BEOL) process, and a through substrate resistive component formed between the FEOL and B-BEOL layers, wherein a first contact of the through substrate resistive component is connected to a drain terminal of the FET and second contact is connected, through the PDN, to a power supply rail.