Movable Ground Electrode Ion Beam Current Control

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Ion implanters face challenges in maintaining stable operation and maximizing beam current over a range of energies, as conventional designs result in lower current extraction for lower ion energies due to electrode separation settings intended to prevent arcing at higher voltages.

Innovation Solution

An adjustable acceleration/deceleration column with a reversibly movable ground electrode allows for varying electrode separation and potential adjustments, optimizing beam current and optics across different ion energies and currents by moving the ground electrode between predefined positions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If electrode separation is increased to prevent arcing at high voltages, then reliability is improved, but beam current decreases

Engineering Contradiction:
Improvearc preventionVSAvoidbeam current
Core Design Contradiction:
ReliabilityVSQuantity of substance

Solution Approach 1:

The ground electrode is made movable along the beam axis, allowing the electrode separation to be dynamically adjusted based on the operating voltage. At high voltages (e.g., 300 kV), the electrode separation is increased to prevent arcing, while at lower voltages (e.g., 1-50 kV), the separation is decreased to maximize beam current extraction. This dynamic adjustment resolves the contradiction between reliability and beam current quantity.

Inventive Principle:
Principle #15Dynamics

2Productivity

If electrode separation is decreased to increase beam current, then productivity is improved, but electrical breakdown occurs

Engineering Contradiction:
Improvebeam currentVSAvoidelectrical breakdown
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The movable ground electrode enables the system to dynamically optimize electrode separation for each operating condition. When operating at lower voltages where high beam current is needed for productivity, the electrode separation is automatically decreased to maximize current extraction. When voltage increases and arcing risk rises, the separation increases to maintain reliability. This dynamic adaptation resolves the contradiction between productivity and electrical breakdown prevention.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach increases beam current delivery to substrates across a range of ion energies, optimizes beam optics, and avoids electrical breakdown, demonstrating an 88% increase in beam current for lower energies and improved performance in simulations.

Implementation Method 1

a ground electrode disposed adjacent the fixed electrode and configured to conduct the ion beam through a ground electrode aperture, the ground electrode being reversibly movable along a first axis with respect to the fixed electrode between a first position and a second position, wherein a beam current of the ion beam at the substrate varies when the ground electrode moves between the first position and second position

Methodology Applied
Scientific EffectElectrostatics: Electrostatics

Implementation Method 2

a fixed electrode configured to conduct the ion beam through a fixed electrode aperture and to apply a fixed electrode potential to the ion beam

Methodology Applied
Scientific EffectElectrostatics: Electrostatics

Implementation Method 3

an ion source to generate an ion beam for treating a substrate

Methodology Applied
Scientific EffectIonization: Ionisation

Implementation Method 4

an extraction electrode to extract the ion beam at an initial beam potential

Methodology Applied
Scientific EffectElectrostatics: Electrostatics

Data Source

PatentUS20160233048A1Apparatus and method to control ion beam current
Publication Date: 2016.08.11 VARIAN SEMICON EQUIP ASSC INC
  • US20160233048A1 patent drawing
  • US20160233048A1 patent drawing
  • US20160233048A1 patent drawing

AI summary

An apparatus to control an ion beam for treating a substrate. The apparatus may include a fixed electrode configured to conduct the ion beam through a fixed electrode aperture and to apply a fixed electrode potential to the ion beam, a ground electrode assembly disposed downstream of the fixed electrode. The ground electrode assembly may include a base and a ground electrode disposed adjacent the fixed electrode and configured to conduct the ion beam through a ground electrode aperture, the ground electrode being reversibly movable along a first axis with respect to the fixed electrode between a first position and a second position, wherein a beam current of the ion beam at the substrate varies when the ground electrode moves between the first position and second position.