Movable Ion Optics Changer for Adjustable Beam Profiles
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Solution Overview
Problem
Ion sources and ion engines are structurally limited in variability of spatial profiles, energy distribution, and intensity, making it difficult to achieve optimal operating conditions for different applications, particularly in material processing and space thrust generation, and limiting the ability to coat complex surfaces or operate ion engines efficiently across various modes.
Innovation Solution
A device with an ion source and a movable ion optics changer that allows switching between two ion optics configurations, enabling adjustable ion beam profiles by varying the extraction grid system, which can be optimized for specific applications and operating modes, and includes a control and evaluation system for precise beam profile management.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a fixed grid system is used to define the beam profile, then the spatial profile is determined, but the ability to change the beam profile through operating parameters is restricted
Solution Approach 1:
The patent applies the dynamics principle by making the extraction grid system movable and adjustable. The grid system can be dynamically repositioned along the beam axis and laterally, allowing continuous adjustment of the beam profile shape, size, and intensity distribution without requiring multiple fixed grid configurations. This dynamic capability enables the same grid system to adapt to different beam profile requirements.
Solution Approach 2:
The patent implements universality by designing a single adjustable grid system that can perform multiple functions - generating different beam profiles (Gaussian, flat-top, annular), controlling beam intensity, and adapting to various operating conditions. This replaces the need for multiple specialized grid systems, each optimized for a specific beam profile, thereby reducing overall system complexity while increasing versatility.
2Adaptability or versatility
If the grid system operating parameters are varied to change beam profile, then beam intensity and energy distribution change, but the basic shape of the spatial profile remains predetermined
Solution Approach 1:
The patent uses dynamic adjustment of grid positions to achieve precise control over beam profile shape. By independently moving the first and second extraction grids along the beam axis and laterally, the system can precisely control the beam's spatial distribution, intensity, and profile shape. This dynamic positioning capability provides fine-tuned control that fixed parameter systems cannot achieve.
Solution Approach 2:
The patent applies parameter changes by varying the positions, voltages, and geometries of the extraction grids to transform the beam profile from a predetermined shape to an adjustable shape. By changing physical parameters (grid spacing, grid voltage, grid geometry) rather than relying on fixed operating conditions, the system achieves precise control over beam intensity distribution and spatial profile.
3Device complexity
If a single ion source is used, then the system is simpler, but the ability to optimize for different applications and operating modes is limited
Solution Approach 1:
The patent implements universality by equipping a single ion source with an adjustable grid system that can be reconfigured for different applications. The same ion source can be optimized for sputter deposition, ion implantation, or thrust generation by adjusting the grid positions and voltages, eliminating the need for multiple specialized ion sources while maintaining application-specific optimization.
Solution Approach 2:
The patent applies dynamics by making the grid system reconfigurable within a single ion source. The grids can be dynamically adjusted to optimize beam parameters for different operating modes (e.g., high intensity for deposition, focused profiles for implantation, variable thrust for space applications), allowing one ion source to replace multiple fixed-configuration sources.
4Reliability
If the grid system is optimized for one operating mode, then performance is maximized for that mode, but the service life is reduced when operating in other modes
Solution Approach 1:
The patent uses dynamic adjustment of the grid system to optimize operating conditions for each specific mode in real-time. When operating in different modes (deposition, thrust generation, implantation), the grids can be repositioned and re-voltaged to achieve optimal performance parameters, preventing operation in suboptimal conditions that would accelerate wear and extend service life.
Solution Approach 2:
The patent applies parameter changes by adjusting grid voltages, positions, and geometries according to the specific operating mode. This ensures that the grid system operates within optimal parameter ranges for each application, avoiding stress conditions that would reduce component life, while maintaining the flexibility to switch between different operating modes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution allows for flexible ion beam generation, enabling efficient coating of complex surfaces, extending the service life of ion engines, and optimizing performance across different operating modes, reducing wear and increasing the efficiency and versatility of ion engines in both terrestrial and space applications.
Implementation Method 1
Ion sources or ion engines provide a directed ion beam. In general, the beam profiles of ion sources or ion engines can only be varied within small limits
Implementation Method 2
Ion sources or ion engines are often used, in which the ions are extracted from a plasma using a grid system
Implementation Method 3
The ions condense on the bombarded substrate and form a layer there. This is called ion beam deposition. This happens mainly at low energies
Implementation Method 4
Material from the bombarded target is removed as a secondary emission lobe (secondary plume). This is called sputtering. This happens mainly at medium energies. The impacting ion transfers its momentum to the atoms of the target, the bombarded material, which then trigger further collisions in a collision cascade
Implementation Method 5
The ions are built into the target material and possibly form a chemical compound there. This effect is called (reactive) ion implantation. This happens mainly at high energies
Implementation Method 6
In the case of ion thrusters, the recoil that occurs when the ion beam is emitted due to conservation of momentum is used to propel a spacecraft on which the ion thruster is located
Data Source
Figure 1
Figure 2a~2b
AI summary
The invention relates to a device 10 for generating ion beams with adjustable ion beam profiles, which comprises at least one plasma vessel 20 of an ion source with at least two ion optics 25, 26 and an ion optics changer 28. The ion optics changer 28 is configured such that it can move the ion optics 25, 26 between two positions, and the ion beam emanating from the plasma vessel of the ion source 20 can pass through a first ion optic 25 in a first position and, alternatively, a second ion optic 26 in at least one further position.