Movable Table Vacuum Substrate Replacement
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Solution Overview
Problem
Existing multi-beam writing apparatuses require disassembly and exposure to the atmosphere for replacing degraded blanking aperture array substrates, leading to reduced operation rates.
Innovation Solution
A multiple-charged particle-beam irradiation apparatus with a movable table and alignment mechanism allows for the replacement of blanking aperture array substrates without breaking vacuum, using a control circuit to switch and align blankers, enabling continuous operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of repair
If the existing multi-beam writing apparatus is opened to the atmosphere for replacing the blanking aperture array substrate, then the substrate can be replaced, but the operation rate is reduced due to disassembly and reassembly time
Solution Approach 1:
The apparatus is segmented into a vacuum chamber containing the shaping aperture array substrate and a replaceable blanking aperture array substrate holder that can be independently accessed. This allows the blanking substrate to be replaced without opening the entire vacuum chamber, maintaining vacuum integrity while enabling substrate replacement.
Solution Approach 2:
A movable table with a movable holder acts as an intermediary mechanism between the vacuum chamber and the external environment. This intermediary allows the blanking aperture array substrate to be loaded and replaced through a vacuum-compatible interface, eliminating the need to break vacuum for substrate replacement.
2Adaptability or versatility
If the apparatus is disassembled and reassembled for substrate replacement, then the substrate can be changed, but time is lost during the replacement process
Solution Approach 1:
The holder and table are designed with dynamic, movable components that enable quick positioning and replacement of the blanking aperture array substrate. The movable table can rapidly transition between positions to accommodate substrate changes without requiring time-consuming disassembly and reassembly operations.
3Adaptability or versatility
If multiple blanking aperture array substrates are mounted on the same table, then substrate replacement becomes possible, but the table and alignment mechanism must be more complex
Solution Approach 1:
The movable table and alignment mechanism are designed as universal components that can handle multiple blanking aperture array substrates. The same alignment mechanism serves all substrates, and the table provides a unified platform for positioning multiple substrates, reducing overall system complexity compared to having separate mechanisms for each substrate.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the appropriate replacement of blanking aperture array substrates while maintaining the vacuum state, preventing reduction in operation rate and extending apparatus life.
Implementation Method 1
an emitter configured to emit a charged particle beam
Implementation Method 2
blankers respectively disposed in the second apertures to perform blanking deflection of the beams
Data Source
AI summary
A multiple-charged particle-beam irradiation apparatus includes a shaping aperture array substrate that causes a charged particle beam to pass through a plurality of first apertures to form multi-beams, a plurality of blanking aperture array substrates each provided with a plurality of second apertures, which enable corresponding beams to pass, and including a blanker arranged at each of the second apertures, a movable table on which the blanking aperture array substrates are mounted so as to be spaced apart from each other in a second direction, which is orthogonal to a first direction along an optical axis, and that moves in the second direction to position one of the blanking aperture array substrates on the optical axis, and an alignment mechanism that performs an alignment adjustment between the blanking aperture array substrate on the optical axis and the shaping aperture array substrate.