Magnetic Tunnel Junction Layer Structure for Stable TMR and Exchange Field
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Solution Overview
Problem
Magnetic tunnel junction elements face challenges with exchange field degradation and reduced tunneling magnetoresistance due to diffusion and crystalline collisions among layers.
Innovation Solution
Incorporating an amorphous buffer layer with CoFeBX and an auxiliary layer with W, Mo, or Ta, along with a polarization enhancement layer and a tunnel barrier layer, to prevent crystalline collisions and element diffusion, thereby maintaining high tunneling magnetoresistance and exchange field.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional magnetic tunnel junction element structure is used, then device simplicity is maintained, but exchange field degradation and reduced tunneling magnetoresistance occur due to diffusion and crystalline collisions among layers
Solution Approach 1:
An amorphous buffer layer is introduced as an intermediary between the pinned layer and the auxiliary layer. This buffer layer prevents direct crystalline collision and diffusion between the pinned layer and subsequent layers, thereby maintaining high tunneling magnetoresistance and exchange field without requiring complete redesign of the overall structure
Solution Approach 2:
The patent employs a composite layer structure combining amorphous buffer layer (CoFeBX), crystalline auxiliary layer (W, Mo, or Ta), and polarization enhancement layers with varying boron concentrations. This composite structure leverages the advantages of different material phases and compositions to simultaneously achieve high TMR and exchange field while preventing detrimental diffusion and crystalline collisions
2Volume of moving object
If layers are placed close together to reduce device size, then device scaling is improved, but diffusion and crystalline collisions among layers increase causing exchange field degradation
Solution Approach 1:
The amorphous buffer layer serves as a protective intermediary that can be inserted between closely spaced layers without significantly increasing the overall device volume. It prevents diffusion and crystalline collisions between adjacent layers even when they are placed close together for scaling, thereby maintaining exchange field stability in compact device configurations
Solution Approach 2:
The buffer layer is strategically positioned only where diffusion and crystalline collisions are most problematic (between the pinned layer and auxiliary layer), rather than uniformly throughout the entire structure. This localized approach prevents exchange field degradation while minimizing the impact on device volume and maintaining scalability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed structure enhances the crystallinity of each material, maintains high tunneling magnetoresistance, and increases the exchange field, effectively addressing the issues of exchange field degradation and reduced TMR.
Implementation Method 1
Incorporating an amorphous buffer layer with CoFeBX and an auxiliary layer with W, Mo, or Ta, along with a polarization enhancement layer and a tunnel barrier layer, to prevent crystalline collisions and element diffusion
Implementation Method 2
The resistance of a magnetic tunnel junction element changes based on the magnetization direction of a free layer. For example, if the magnetization direction of the free layer is the same as that of a pinned layer, the magnetic tunnel junction element has a low resistance. Conversely, if the magnetization direction of the free layer is opposite to that of the pinned layer, the magnetic tunnel junction element has a high resistance
Implementation Method 3
a polarization enhancement layer between the auxiliary layer and the free layer... the second polarization enhancement layer is between the first polarization enhancement layer and the free layer, and a boron concentration included in the second polarization enhancement layer is lower than a boron concentration included in the first polarization enhancement layer
Data Source
AI summary
A magnetic tunnel junction element including: a pinned layer and a free layer facing each other; a buffer layer on the pinned layer; an auxiliary layer on the buffer layer; a polarization enhancement layer between the auxiliary layer and the free layer; and a tunnel barrier layer between the polarization enhancement layer and the free layer, wherein the buffer layer is amorphous and includes CoFeBX, and X is W, Mo, Re or Ta, the auxiliary layer includes W, Mo, or Ta.


