Aperture Set for Multi-Beam Electric Field Shielding
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Solution Overview
Problem
Conventional multi-beam writing apparatuses suffer from reduced writing accuracy due to beam path curvature caused by electric field leakage from adjacent beams, leading to positional deviations on the sample surface.
Innovation Solution
An aperture set comprising a shaping aperture array, a blanking aperture array, and an electric field shield plate is used, where the electric field shield plate with a high resistance film is positioned to prevent electric field leakage, thereby maintaining beam path straightness and preventing positional deviations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a multi-beam writing apparatus uses a blanking aperture array to irradiate multiple beams at once, then productivity is significantly improved, but electric field leakage from adjacent beams causes beam path curvature and writing accuracy deteriorates
Solution Approach 1:
A shield plate is introduced as an intermediary component between adjacent beams in the multi-beam writing apparatus. This shield plate blocks the electric field leakage from adjacent beams, preventing the harmful electric field from curving the beam path. The shield plate serves as a mediator that isolates each beam from the electric field interference of neighboring beams, thereby maintaining writing accuracy while preserving the high productivity of multi-beam operation
Solution Approach 2:
The harmful electric field leakage is extracted and blocked by the shield plate. The shield plate selectively allows the desired electron beams to pass through while extracting and blocking the harmful electric field components from adjacent beams. This separation of useful beams from harmful electric field interference resolves the contradiction between maintaining beam integrity and operating multiple beams simultaneously
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The electric field shield plate effectively suppresses electric field leakage, maintaining accurate beam positioning and improving writing accuracy by preventing beam path curvature and positional deviations.
Implementation Method 1
an electric field shield plate that is disposed to be opposed to the blanking aperture array and includes a plurality of third openings, through each of which a beam is passed, corresponding to part of the multi-beam
Implementation Method 2
the pair of blanking electrodes that perform blanking deflection of a beam, the pair of blanking electrodes being provided oppositely across the second opening
Data Source
AI summary
In one embodiment, an aperture set for multi-beam includes a shaping aperture array in which a plurality of first openings are formed, and which forms a multi-beam by allowing part of a charged particle beam to pass through corresponding ones of the plurality of first openings, a blanking aperture array in which a plurality of second openings are formed, the plurality of second openings each including a pair of blanking electrodes that perform blanking deflection of a beam, and an electric field shield plate that is disposed to be opposed to the blanking aperture array and includes a plurality of third openings. The electric field shield plate has a substrate, and a high resistance film provided on a surface of the substrate, the surface being opposed to the blanking aperture array, and the high resistance film has a higher electrical resistance value than an electrical resistance value of the substrate.