Multi-beam Source Electrostatic Lens Aberration Correction
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Solution Overview
Problem
Existing multi-beam sources for lithography and microscopy suffer from imaging aberrations and distortions due to the use of optical systems, leading to blurry patterns and images, and require complex lens setups to correct for aberrations, which are costly and difficult to adapt to changing beam conditions.
Innovation Solution
A multi-beam source employing an electrical zone device with a composite electrode and partial electrodes arranged in sets, allowing for individual control of beamlets and correction of aberrations, combined with an annular electrode to form an electrostatic lens, which improves illumination and corrects image distortions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If optical systems (lenses) are used to form and focus beams, then beam formation and focusing are achieved, but imaging aberrations and distortions occur leading to blurry patterns
Solution Approach 1:
The patent extracts the problematic optical lens system from the beam formation process and replaces it with a direct electronic control approach using electrostatic deflectors and shutters that manipulate charged particles without optical intermediaries, thereby eliminating lens-induced aberrations
Solution Approach 2:
The patent replaces the mechanical/optical lens system with an electrostatic field-based control system using deflectors and shutters, substituting physical optical components with electric field manipulation to achieve beam formation without aberrations
2Reliability
If complex lens setups are used to correct aberrations, then imaging quality improves, but device complexity and cost increase
Solution Approach 1:
The patent replaces complex mechanical/optical correction systems with electronic control of electrostatic deflectors and shutters, using software-programmable electrode configurations to correct beam paths without additional physical lenses or optical components
Solution Approach 2:
The patent implements dynamically adjustable electrostatic field configurations through programmable voltage control of deflectors and shutters, allowing real-time adaptation to different beam conditions and patterns without physical reconfiguration of optical components
3Stability of the object's composition
If fixed lens configurations are used, then beam formation is stable, but adaptability to changing beam conditions is poor
Solution Approach 1:
The patent employs dynamically controllable electrostatic deflectors and shutters with programmable voltage control, enabling real-time adaptation to varying beam conditions, patterns, and parameters while maintaining stable and precise beam formation through electronic feedback and control
Solution Approach 2:
The patent creates a universal beam control system where the same electrostatic deflector and shutter apparatus can handle multiple beam types, patterns, and configurations through software control, replacing the need for multiple specialized optical components
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution produces beamlets with low emittance and homogeneous current distribution, effectively reducing aberration effects and allowing for precise control of beamlets, enhancing imaging quality and adaptability to deviations in beam alignment.
Implementation Method 1
an annular electrode to form an electrostatic lens, which improves illumination and corrects image distortions
Implementation Method 2
The beam forming system is configured to be illuminated by the illuminating beam and is adapted to form a plurality of preferably substantially homocentric or telecentric beamlets out of the beam
Implementation Method 3
A multi-beam source employing an electrical zone device with a composite electrode and partial electrodes arranged in sets, allowing for individual control of beamlets and correction of aberrations
Data Source
Figure 1~1a
Figure 2~3
Figure 4a~6a
AI summary
A multi-beam source (101) for generating a plurality of beamlets (112) of energetic electrically charged particles, the multi-beam source comprising an illumination system (102) generating an illuminating beam of charged particles and a beam-forming system (103) being arranged after the illumination system as seen in the direction of the beam and adapted to form a plurality of telecentric or homocentric beamlets (112) out of the illuminating beam, said beam forming system (103) comprising a beam-splitting means and an electrical zone device (109), said electrical zone comprising a composite electrode (110) being composed of a number of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.