Multi-Beam Patterning Tool Alignment via Image Feedback
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Solution Overview
Problem
Current multi-beam patterning tools face challenges with time-intensive accuracy measurements and increased inaccuracy due to cumulative irregularities from unaligned beams, leading to higher costs and longer patterning times.
Innovation Solution
A multi-beam patterning system equipped with a pattern correction controller that compares image data to a standard to identify irregularities and adjusts beams in real-time, allowing for simultaneous alignment of multiple beams and reducing error propagation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multi-beam patterning is used to reduce patterning time, then productivity is improved, but manufacturing precision deteriorates due to cumulative irregularities from unaligned beams
Solution Approach 1:
The system captures an image of the test pattern, compares it to a stored reference image, identifies irregularities in feature positions, and uses this feedback information to adjust beam positions. This closed-loop feedback mechanism eliminates cumulative alignment errors while maintaining the speed advantages of multi-beam patterning.
Solution Approach 2:
The patent replaces traditional mechanical alignment methods with an optical/image-based measurement and correction system. By using imaging to detect feature positions and comparing them to reference data, the system substitutes mechanical adjustment procedures with automated optical measurement and digital correction.
2Manufacturing precision
If sequential beam alignment is performed to improve accuracy, then manufacturing precision is improved, but productivity deteriorates due to time-intensive measurements
Solution Approach 1:
The system merges the alignment verification process for multiple beams into a single imaging operation. By capturing all beam-generated features in one test pattern image and comparing them simultaneously to reference data, the system achieves comprehensive alignment verification without sequential measurements, thus improving productivity while maintaining precision.
3Productivity
If multi-beam systems are used to increase patterning speed, then productivity is improved, but device complexity increases due to alignment control requirements
Solution Approach 1:
The system performs self-alignment by automatically capturing its own test pattern image, comparing it to reference data, and adjusting beam positions based on detected irregularities. This self-service alignment capability eliminates the need for complex external alignment equipment and manual intervention, reducing overall system complexity while maintaining multi-beam patterning speed.
Data Source
AI summary
Alignment of multi-beam pattern tools includes generating a test pattern having multiple features with a multi-beam patterning tool, acquiring an image standard associated with a test pattern standard, acquiring an image of a portion of the test pattern, comparing the portion of the image of the test pattern to the image standard to identify one or more irregularities between the portion of the image of the test pattern and the image standard, and adjusting one or more beams of the multi-beam patterning tool based on the one or more identified irregularities between the portion of the image of the test pattern and the image standard.