Multi-Beam SEM Focus Adjustment via Parallel Image Analysis
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Solution Overview
Problem
Current single-beam scanning electron microscopy (SEM) systems face inefficiencies in focus adjustment, requiring multiple images at different settings and often necessitating astigmatism correction, which prolongs the inspection process and reduces tool availability.
Innovation Solution
A multi-beam SEM system with a controller that simultaneously acquires images from multiple electron beams, identifies the best focus or astigmatism settings by analyzing image quality parameters, and adjusts the electron beams accordingly, enabling rapid focus adjustment through techniques like focus and astigmatism gradients or sweeping during image acquisition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If multiple images are acquired at different focus settings in a single-beam SEM, then focus adjustment accuracy is improved, but inspection time increases
Solution Approach 1:
The patent divides the single inspection task into multiple parallel inspection tasks by using multiple electron beams. Each beam inspects a different region of the sample simultaneously, allowing focus evaluation to occur in parallel across multiple fields of view rather than sequentially in a single field of view.
Solution Approach 2:
The patent combines multiple electron beams into a single multi-beam system that operates simultaneously. The detector assembly integrates signals from all beams, and the controller coordinates their operation to perform focus adjustment evaluation in a single coordinated operation rather than multiple separate operations.
2Measurement precision
If astigmatism correction is performed in addition to focus adjustment, then image quality is improved, but the number of images required increases
Solution Approach 1:
The patent segments the astigmatism evaluation into multiple parallel evaluations across different beams and fields of view. By distributing the evaluation across multiple simultaneous images, the system can assess astigmatism effects more comprehensively without requiring a proportional increase in total inspection time.
Solution Approach 2:
The system implements automated feedback by analyzing image quality parameters from the acquired images and using this information to determine optimal focus and astigmatism settings. The controller processes the images and automatically identifies the best settings without requiring manual intervention or additional corrective imaging steps.
3Measurement precision
If multiple images are acquired for focus evaluation, then focus determination accuracy is improved, but tool availability decreases
Solution Approach 1:
The patent segments the focus evaluation process into simultaneous parallel operations across multiple electron beams. Each beam independently evaluates focus in its own field of view while others do the same, transforming a sequential process into a parallel one that achieves the same evaluation accuracy in less time.
Solution Approach 2:
The system performs preliminary focus evaluation using the multi-beam configuration before final inspection begins. By pre-establishing optimal focus settings through simultaneous multi-beam evaluation, the system eliminates the need for time-consuming focus adjustments during the actual inspection process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces the time required for focus adjustment, increases the efficiency of the inspection process, and enhances the availability of the inspection tool by allowing simultaneous acquisition and analysis of multiple images for optimal focus and astigmatism settings.
Implementation Method 1
a multi-beam electron source configured to form a plurality of electron beams
Implementation Method 2
an electron-optical assembly including a set of electron-optical elements configured to direct at least a portion of the plurality of electron beams onto a portion of the sample
Data Source
AI summary
A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.


