Multi-Charged Particle Beam Writing Apparatus Defect Compensation
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Solution Overview
Problem
Multi-beam writing apparatuses face challenges with defective beams due to structural complexity, leading to reduced writing accuracy and increased resource requirements, as maintaining high accuracy with existing redundancy methods necessitates excessive hardware and software resources.
Innovation Solution
A multi-charged particle beam writing apparatus that detects defective beams and adjusts by reconfiguring the aperture member to utilize remaining beams efficiently, allowing for continued writing with minimal resource increase by shifting beam positions and controlling beam states to compensate for defective beams.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If redundancy method is used to maintain writing accuracy by preparing many more beams, then writing accuracy is maintained, but device complexity and resource requirements increase excessively
Solution Approach 1:
The system dynamically adjusts the number of beams to be used based on detected defective beams. The control unit determines the actual number of functional beams and adjusts writing parameters accordingly, transforming a static redundant beam system into a dynamic adaptive system that maintains accuracy without excessive resources
Solution Approach 2:
The invention changes the parameter of beam quantity from a fixed predetermined number to a dynamically determined number based on actual beam functionality. By detecting defective beams and adjusting the effective beam count, the system adapts parameters to maintain writing accuracy while optimizing resource usage
2Productivity
If multiple beams are used for writing to increase throughput, then productivity is improved, but the likelihood of defective beams increases due to structural complexity
Solution Approach 1:
The system implements feedback by detecting defective beams before writing operations and using this information to adjust the number of beams to be used. The detection unit provides feedback on beam functionality, and the control unit responds by determining the actual number of functional beams, creating a closed-loop system that maintains reliability while preserving productivity
Solution Approach 2:
The system performs preliminary detection of defective beams before the actual writing process. By identifying and accounting for non-functional beams in advance, the system prepares the optimal number of beams to use, ensuring both high productivity and reliability without during the writing operation
3Manufacturing precision
If the number of beams is increased to compensate for defective beams, then writing accuracy is maintained, but loss of time for detecting and measuring increases
Solution Approach 1:
The system extracts and removes defective beams from the operational set by detecting them and adjusting the number of beams to be used. This extraction process eliminates the need to account for defective beams during writing, reducing the complexity and time of beam management while maintaining writing accuracy
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach maintains writing accuracy without increasing the number of beams, enabling efficient writing operations even with defective beams, thus reducing resource demands and improving throughput.
Implementation Method 1
an emission unit that emits a charged particle beam; an aperture member in which a plurality of openings are formed, and configured to form multiple beams by letting a first region including a whole of the plurality of openings be irradiated by the charged particle beam
Implementation Method 2
a plurality of blankers that respectively perform blanking deflection of a corresponding beam in multiple beams having passed through the plurality of openings of the aperture member
Data Source
AI summary
A multi charged particle beam writing apparatus according to an embodiment, includes a setting unit to set a second region such that more openings in remaining openings except for an opening through which the defective beam passes are included in the second region, a selection unit to select a mode from a first mode in which a pattern is written on a target object by using multiple beams having passed openings in the second region and a second mode in which multiple writing is performed while shifting a position by using at least one of remaining multiple beams in the state where the defective beam is controlled to be beam off and additional writing is performed for a position which was supposed to be written by the defective beam, and a writing processing control unit to control to write in the mode selected.