Multi-Port Valve Assembly for Plasma Chamber Vacuum Control

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Solution Overview

Problem

Plasma processing devices require complex valve systems with multiple controllers and actuators to manage fluid communication between plasma processing chambers and vacuum pumps, leading to increased costs, space requirements, and potential communication issues between master and slave controllers.

Innovation Solution

A multi-port valve assembly with a single controller and actuator that can open, close, or seal multiple vacuum ports simultaneously, reducing the need for multiple controllers and actuators, and eliminating communication issues by integrating a movable seal plate with transverse and sealing actuators to manage fluid flow efficiently.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If multiple controllers and actuators are used to manage fluid communication between plasma processing chambers and vacuum pumps, then the valve system can control multiple ports, but the device complexity and cost increase

Engineering Contradiction:
Improvevalve control capabilityVSAvoidcontroller and actuator quantity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent combines multiple valve functions into a single multi-port valve assembly that can control fluid communication between the plasma processing chamber and multiple vacuum pumps simultaneously. This merging of functions reduces the number of separate controllers and actuators needed while maintaining the ability to manage complex vacuum pathways

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The multi-port valve assembly serves multiple functions: it can selectively connect the plasma chamber to different vacuum pumps, control exhaust flow paths, and manage pressure differentials. This universal valve design eliminates the need for separate dedicated valves for each function, reducing overall system complexity

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Ease of operation

If multiple controllers are used to manage valve systems, then comprehensive control is achieved, but communication issues between controllers may occur

Engineering Contradiction:
Improvevalve management capabilityVSAvoidcontroller communication reliability
Core Design Contradiction:
Ease of operationVSReliability

Solution Approach 1:

The patent integrates control of multiple vacuum pathways into a single controller that manages the multi-port valve assembly. This consolidation eliminates communication interfaces between multiple controllers, removing a potential source of failures while maintaining comprehensive control over all valve functions

Inventive Principle:
Principle #5Merging (Combining)

3Ease of operation

If multiple actuators are used to control multiple valves, then precise control of each port is achieved, but space requirements increase

Engineering Contradiction:
Improveport control precisionVSAvoidactuator and controller space
Core Design Contradiction:
Ease of operationVSVolume of moving object

Solution Approach 1:

The patent employs a single actuator that controls the multi-port valve assembly's internal components to direct fluid flow between different ports. This single actuator replaces what would traditionally require multiple actuators, significantly reducing the space needed for actuation mechanisms while maintaining precise control over port connectivity

Inventive Principle:
Principle #5Merging (Combining)

Data Source

PatentUS12100575B2Plasma processing devices having multi-port valve assemblies
Publication Date: 2024.09.24 LAM RES CORP
  • US12100575B2 patent drawing
  • US12100575B2 patent drawing
  • US12100575B2 patent drawing

AI summary

A plasma processing device may include a plasma processing chamber, a plasma electrode assembly, a wafer stage, a plasma producing gas inlet, a plurality of vacuum ports, at least one vacuum pump, and a multi-port valve assembly. The multi-port valve assembly may comprise a movable seal plate positioned in the plasma processing chamber. The movable seal plate may comprise a transverse port sealing surface that is shaped and sized to completely overlap the plurality of vacuum ports in a closed state, to partially overlap the plurality of vacuum ports in a partially open state, and to avoid substantial overlap of the plurality of vacuum ports in an open state. The multi-port valve assembly may comprise a transverse actuator coupled to the movable seal plate and a sealing actuator coupled to the movable seal plate.