Multi-Source Deposition Module for Uniform Substrate Edge Coating
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Solution Overview
Problem
Existing substrate deposition processes face challenges in efficiently forming uniform deposition layers on substrates, particularly at the edges, and often require multiple steps to complete the deposition process, which can affect the lifespan and efficiency of the resulting products.
Innovation Solution
A substrate deposition apparatus and method utilizing a deposition source module with multiple deposition sources arranged in a horizontal direction, allowing for simultaneous deposition of different materials on a substrate, with denser arrangement at the edges to ensure uniformity and efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a conventional single deposition source is used, then the deposition process requires multiple steps to complete, but this increases processing time and affects product lifespan
Solution Approach 1:
The deposition source is divided into multiple independent deposition sources (first, second, third, and fourth deposition sources) arranged in a horizontal direction, each capable of depositing different materials simultaneously. This segmentation allows multiple deposition operations to be performed in parallel, eliminating the need for multiple sequential steps and reducing total processing time.
Solution Approach 2:
Multiple deposition sources that would traditionally operate in separate sequential steps are merged into a single deposition chamber and activated simultaneously. The first, second, third, and fourth deposition sources are positioned to deposit materials onto different regions of the substrate at the same time, combining multiple operations into one efficient process step.
2Manufacturing precision
If deposition sources are uniformly arranged across the substrate, then the structure is simple, but uniform deposition layers cannot be formed at the edges
Solution Approach 1:
The deposition sources are arranged with non-uniform spacing where the first and fourth deposition sources are positioned closer to the edges of the substrate compared to the second and third deposition sources in the middle. This local variation in source placement ensures that edge regions receive adequate deposition material flux, achieving uniform deposition layers across the entire substrate surface including edges.
Solution Approach 2:
The deposition source arrangement exhibits asymmetric positioning relative to the substrate center, with outer deposition sources (first and fourth) placed closer to substrate edges than inner sources. This asymmetric configuration compensates for the naturally lower material flux at substrate edges, enabling uniform deposition across the entire surface.
3Manufacturing precision
If multiple deposition sources are used to improve deposition uniformity, then deposition quality improves, but the device structure becomes more complex
Solution Approach 1:
The deposition source module is designed as an integrated unit where multiple deposition sources share common support structures, heating systems, and control mechanisms. Each deposition source can be independently activated to deposit different materials, providing multi-functionality within a single modular structure that reduces overall system complexity despite containing multiple sources.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus enables the formation of uniform deposition layers across the entire substrate, improving product lifespan and reducing processing time by allowing for a single-step deposition process.
Implementation Method 1
heating the deposition source module
Implementation Method 2
moving the deposition source module in a direction parallel to a second direction that is a horizontal direction
Data Source
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AI summary
A substrate deposition method includes placing a substrate in a substrate deposition apparatus and performing a deposition process on the substrate in the substrate deposition apparatus. The substrate deposition apparatus includes a process chamber having a process space, a stage in the process chamber, and a deposition source module. The deposition source module includes a plurality of first deposition sources arranged in a first direction that is a horizontal direction, a plurality of second deposition sources arranged in the first direction, a plurality of third deposition sources arranged in the first direction, and a plurality of fourth deposition sources arranged in the first direction. The performing of the deposition process on the substrate includes heating the deposition source module and moving the deposition source module in a direction parallel to a second direction that is a horizontal direction intersecting the first direction.