Multi-Source Charged Particle Illumination for High-Density Sub-Beams
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Solution Overview
Problem
Current multi-beam illumination apparatuses face limitations in increasing the number of beams due to physical constraints and aberrations, particularly with single-source systems, which restrict throughput and image quality in applications like SEM and lithography.
Innovation Solution
A multi-source illumination apparatus is developed, utilizing multiple sources with a single condenser lens and manipulator array to generate a multi-beam of charged particles in a single column, where beams intersect and are collimated, reducing aberrations and increasing illumination area without increasing condenser lens size.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single-source system is used to generate multi-beam, then the device complexity is reduced, but the number of sub-beams that can be generated is limited due to physical constraints and aberrations
Solution Approach 1:
The patent divides the illumination system into multiple independent sources instead of using a single source. Each source generates its own beam, and these beams are combined through a condenser lens to form a multi-beam illumination system. This segmentation allows generation of a larger number of sub-beams while managing aberrations through the optical design.
2Productivity
If the number of beams is increased in a single-source system, then the throughput is improved, but aberrations increase and image quality deteriorates
Solution Approach 1:
The patent introduces a condenser lens as an intermediary optical element that receives beams from multiple sources and combines them into a multi-beam configuration. This intermediary component enables the system to achieve high throughput with multiple beams while controlling aberrations through its optical design, thereby maintaining image quality.
3Area of stationary object
If the condenser lens size is increased to accommodate more beams, then the illumination area is increased, but the device complexity and size increase
Solution Approach 1:
The patent transitions from a single-source configuration to a multi-source arrangement, utilizing spatial distribution of multiple sources in different dimensions. This allows the system to achieve larger effective illumination area without requiring a proportionally larger condenser lens, as multiple smaller beams are combined to create the extended illumination coverage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the number of sub-beams that can be generated, improving throughput and image quality by minimizing aberrations and allowing for a larger illumination area, thus addressing the limitations of single-source systems.
Implementation Method 1
the condenser lens is configured to separately substantially collimate the received beams from each source
Implementation Method 2
the manipulator array arrangement is configured to manipulate the beams that have been substantially collimated by the condenser lens to thereby generate one or more beams, in a single column, that comprise charged particles from the plurality of sources
Data Source
AI summary
A multi-source illumination apparatus for illuminating a sample with charged particles, wherein beams, from a plurality of sources, are arranged such that a beam from at least one source intersects, at a plane of a condenser lens, with at least part of one other beam from a different one of the plurality of sources. The condenser lens is configured to separately collimate the received beams from each source. A manipulator array arrangement is configured to manipulate the collimated beams to generate one or more beams, in a single column, that include charged particles from the plurality of sources. The manipulator array arrangement includes a multi-beam generator configured to receive the plurality of substantially parallel substantially collimated beams generated by the deflector array, and generate a multibeam in dependence on the received plurality of substantially parallel substantially collimated beams, wherein the multi-beam includes a plurality of substantially collimated sub-beams.