Multi-Stage Deflector Charged Particle Beam Writing
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Solution Overview
Problem
The variable shaped beam system in semiconductor lithography faces limitations in deflection range and throughput due to the need for extensive calculation processing and division of figure patterns into numerous shot figures, leading to increased calculation time and decreased writing efficiency.
Innovation Solution
A charged particle beam writing apparatus and method that generates a smallest deflection region layer in multiple layers with different sizes for each figure type, assigns shot figure patterns to these layers, and corrects their positions to achieve efficient writing without reducing throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If position correction is performed for each shot figure to account for figure type, then writing precision is improved, but calculation processing time increases significantly
Solution Approach 1:
The patent segments figure patterns into multiple shot figures and organizes them into deflection region layers. By dividing the correction task across layers rather than applying individual corrections to each shot figure, the system reduces calculation complexity while maintaining precision.
Solution Approach 2:
The patent performs preliminary organization of shot figures into deflection region layers before writing. This preliminary structuring allows the system to pre-determine deflection regions and reduce the need for extensive real-time position correction calculations during the writing process.
2Manufacturing precision
If figure patterns are divided into numerous shot figures, then beam shaping precision is improved, but throughput decreases due to increased calculation processing
Solution Approach 1:
The patent segments figure patterns into shot figures organized in deflection region layers, where each layer contains shot figures that can be written without requiring position correction. This segmentation maintains beam shaping precision while reducing the computational overhead that limits throughput.
Solution Approach 2:
By organizing shot figures into layers where figures within the same layer share common deflection regions, the patent enables continuous writing operations without interruption for position correction calculations, thereby maintaining higher throughput.
3Device complexity
If a single deflector is used for beam deflection, then device complexity is reduced, but deflection range is limited causing deviation in deflectable region
Solution Approach 1:
The patent segments the deflection function into multiple deflectors (first deflector for coarse deflection and second deflector for fine deflection). This segmentation enables each deflector to operate within optimized ranges, achieving comprehensive deflection coverage without requiring any single deflector to handle the entire range.
Solution Approach 2:
The patent adds a dimensional layer to the deflection system by introducing multiple deflectors operating in sequence. The first deflector handles one dimension of deflection (coarse positioning) while the second deflector handles another dimension (fine positioning), creating a multi-dimensional deflection capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for precise beam shaping and positioning without the need for extensive position correction for each shot figure, maintaining high throughput and improving writing precision by using a multi-stage deflector system to correct deviation amounts efficiently.
Implementation Method 1
a charged particle source configured to emit a charged particle beam
Implementation Method 2
a first deflector and a second deflector, and a shaping deflector configured to deflect the charged particle beam emitted from the charged particle source
Data Source
AI summary
Charged particle beam writing apparatus includes a first generation unit to generate a smallest deflection region layer in three or more deflection region layers each having deflection regions of a size different from those of other deflection region layers, for each of a plurality of figure types variably shapable using first and second shaping apertures, an assignment unit to assign each of a plurality of shot figure patterns to deflection regions of the smallest deflection region layer of a corresponding one of the plurality of figure types, a correction unit to correct, by shifting the position of each smallest deflection region layer, according to a variable shaping position of each figure type, and a writing unit to write each of the plurality of shot figure patterns on a target object, in a state where the position of each smallest deflection region layer has been corrected for each figure type.