Multi-Zone Substrate Heater Uniformity Control
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Solution Overview
Problem
Substrate heating apparatuses fail to uniformly heat substrates, leading to non-uniform etch rates across different regions, which affects the consistency of cleaning processes in manufacturing flat display devices and semiconductor devices.
Innovation Solution
A substrate treating apparatus with a rotatable support unit and a heating unit featuring multiple heaters in distinct zones, controlled by a controller using different power modes and PID control, ensures uniform heating across the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a substrate heating apparatus is used to increase etch rate, then the etch rate increases, but the heating is not uniform across the substrate leading to non-uniform etch rates
Solution Approach 1:
The heating apparatus is divided into multiple independent heating zones (first heating zone, second heating zone, third heating zone) with separate heaters. Each zone can be controlled independently to achieve uniform temperature distribution across the substrate, resolving the non-uniform heating problem while maintaining high etch rates
Solution Approach 2:
Different heating powers are applied to different zones based on their specific requirements. The controller provides different powers to each heater to compensate for heat loss variations across zones, ensuring uniform temperature and etch rate across the entire substrate surface
2Manufacturing precision
If multiple heating zones with different powers are used to achieve uniform heating, then uniformity improves, but the control system complexity increases
Solution Approach 1:
Temperature sensors are placed in each heating zone to detect actual temperatures. The controller receives this feedback and automatically adjusts the power to each heater to maintain the target temperature, simplifying the control process while achieving uniform heating across all zones
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves uniform cleaning rates across the entire substrate by precisely controlling heater zones, reducing temperature stabilization time and preventing heating irregularities, thus enhancing process consistency.
Implementation Method 1
a heating unit heating the substrate supported by the support unit. The heating unit may include a plurality of heaters installed in a plurality of zones of the support unit, respectively
Implementation Method 2
the controller may control the plurality of heaters by a first mode until the plurality of zones reach a target temperature, and the controller may control the plurality of heaters by a second mode different from the first mode after the plurality of zones reach the target temperature
Data Source
AI summary
The inventive concepts relate to an apparatus for treating a substrate. The apparatus includes a container having a treatment space of which a top end is opened, a rotatable support unit supporting a substrate disposed within the treatment space, a heating unit heating the substrate supported by the support unit, and a fluid supply unit supplying a fluid to the substrate disposed on the support unit. The heating unit includes a plurality of heaters installed in a plurality of zones of the support unit, respectively, and a controller controlling the plurality of heaters. The controller controls the plurality of heaters by a first mode until the plurality of zones reach a target temperature, and the controller controls the plurality of heaters by a second mode different from the first mode after the plurality of zones reach the target temperature.