Multibeam Electron Exposure Apparatus Coulomb Distortion Control
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Solution Overview
Problem
In complementary lithography, the Coulomb force between multiple beams from a multibeam optical system causes positional changes during exposure, affecting the intended irradiation pattern, leading to inaccuracies in line pattern cutting and via formation.
Innovation Solution
An exposure apparatus with a multibeam optical system that can individually control the irradiation state of each beam, using a controller to adjust the relative movement and irradiation position of beams based on positional changes, ensuring precise alignment and pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a multibeam optical system is used for charged particle beam exposure, then productivity is improved through parallel irradiation of multiple beams, but manufacturing precision deteriorates due to Coulomb force causing positional shifts of beams on the irradiation surface
Solution Approach 1:
The patent pre-calculates and stores distortion correction data for various beam combination patterns before actual exposure. The controller retrieves appropriate correction data based on the current exposure pattern and applies it in advance, eliminating the need for real-time correction during exposure and maintaining both high throughput and precision.
Solution Approach 2:
The system implements a feedback mechanism where the controller monitors the irradiation state of multiple beams and dynamically adjusts beam positions based on pre-calculated distortion correction data. This feedback loop compensates for Coulomb force effects while maintaining exposure efficiency.
2Manufacturing precision
If the irradiation state of each beam is individually controlled to match target patterns, then manufacturing precision is improved, but device complexity increases due to dynamic on/off switching of multiple beams
Solution Approach 1:
The patent pre-calculates distortion correction data for various beam combination patterns and stores them in memory before exposure. This preliminary preparation simplifies the control system during actual exposure, as the controller only needs to retrieve and apply pre-computed correction data rather than performing complex real-time calculations.
Solution Approach 2:
The system dynamically adjusts beam irradiation positions based on the actual irradiation state of other beams. The controller modifies beam positions in real-time according to the current exposure pattern, enabling precise pattern formation while adapting to changing beam combinations.
3Manufacturing precision
If beam positions are adjusted in real-time to compensate for Coulomb force, then manufacturing precision is improved, but exposure time increases due to additional control operations
Solution Approach 1:
The patent pre-calculates distortion correction data for various beam combination patterns and stores them in memory before exposure begins. This eliminates the need for complex real-time calculations during exposure, allowing the system to quickly retrieve and apply appropriate correction data, thus maintaining high precision without significantly increasing exposure time.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables high-precision cutting of line patterns and formation of line-and-space patterns by compensating for positional shifts caused by Coulomb interactions, improving the accuracy and throughput of the exposure process.
Implementation Method 1
a Coulomb force (Coulomb interaction) acts among a plurality of beams irradiated from the multibeam optical system
Data Source
AI summary
A beam irradiation device that irradiates a plurality of electron beams includes a multibeam optical system that emits the plurality of beams to be irradiated on a target; and a controller that controls an irradiation state of each of the plurality of beams in accordance with change in a relative position between the target and the multibeam optical system, and based on the irradiation state of a first beam of the plurality of beams, controls the irradiation state of a second beam of the plurality of beams.