Multi-Beam Charged Particle Alignment for Deflector Array Collimation
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Solution Overview
Problem
Existing apparatuses for generating a plurality of charged particle beamlets face challenges in accurately aligning the beamlets with the deflector array, leading to potential deviations or blockages in the deflection process.
Innovation Solution
The apparatus includes a charged particle source, a beam splitter, a deflector array, and a beam manipulation device that generates electric and/or magnetic fields to optimize the alignment of the charged particle beamlets with respect to the deflector array, allowing for adjustments during operation to correct for thermal expansions or drift.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single electron lens is used for collimation, then the device structure is simple, but it becomes impractical when the size of the beamlet array is large
Solution Approach 1:
The patent divides the single electron lens into multiple electron lenses arranged in an array. Each electron lens corresponds to a specific beamlet, allowing independent collimation of multiple beamlets. This segmentation enables the system to handle large beamlet arrays that would be impractical with a single lens.
2Manufacturing precision
If mechanical alignment is made highly accurate, then beamlet alignment with deflector array is improved, but the apparatus becomes more complex and difficult to adjust for thermal expansions and drift
Solution Approach 1:
The patent introduces adjustable parameters for each electron lens (such as lens strength and positioning) that can be dynamically modified during operation. This allows the system to adapt to thermal expansions and drift without requiring extremely rigid mechanical alignment, reducing the complexity of mechanical precision requirements.
Solution Approach 2:
The patent enables adjustment of operational parameters (lens currents, positions) to compensate for alignment deviations caused by thermal effects and drift. By changing these parameters, the system maintains beamlet alignment with the deflector array without requiring permanent mechanical precision.
3Reliability
If the apparatus allows real-time adjustment for thermal expansions and drift, then alignment stability is improved, but the control system becomes more complex
Solution Approach 1:
The patent incorporates feedback mechanisms that monitor beamlet positions and deflector array alignment, then automatically adjust electron lens parameters to maintain proper alignment. This feedback loop compensates for thermal expansions and drift in real-time, improving reliability while keeping the control complexity manageable through automated adjustment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables precise alignment of the charged particle beamlets with the deflector array, minimizing deviations and blockages, and allowing for real-time adjustments to maintain optimal alignment.
Implementation Method 1
a beam manipulation device configured for generating electric and/or magnetic fields at least in an area between the charged particle source and the deflector array
Implementation Method 2
a beam manipulation device configured for generating electric and/or magnetic fields at least in an area between the charged particle source and the deflector array
Implementation Method 3
a deflector array comprising an array of deflectors comprising one deflector for each charged particle beamlet of said array of charged particle beamlets, wherein the deflector array is configured to at least substantially collimate the array of diverging charged particle beamlets
Data Source
AI summary
Disclosed are an apparatus and method for generating a plurality of substantially collimated charged particle beamlets. The apparatus includes a charged particle source for generating a diverging charged particle beam, a beam splitter for splitting the charged particle beam in an array of charged particle beamlets, a deflector array includes an array of deflectors including one deflector for each charged particle beamlet of said array of charged particle beamlets, wherein the deflector array is configured for substantially collimating the array of diverging charged particle beamlets. The apparatus further includes a beam manipulation device configured for generating electric and/or magnetic fields at least in an area between the charged particle source and the deflector array. The apparatus has a central axis, and the beam manipulation device is configured for generating electric and/or magnetic fields substantially parallel to the central axis and substantially perpendicular to the central axis.