Multilayer Film Etchant Composition for Tip Reduction
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Solution Overview
Problem
Existing etchants for multilayer films in display devices face challenges in controlling etch rates and uniformity, leading to tip formation and non-uniform profiles, which affect the manufacturing yield and quality of display devices.
Innovation Solution
An etchant composition comprising persulfate, a fluorine-containing compound, a chlorine-containing compound, a cyclic amine compound, an inorganic acid, and sulfate, with a tip control index (Y) of 45.0 to 70.0, which controls etch rates and reduces tip formation, ensuring uniform etching of multilayer films.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If existing etchants are used for multilayer films, then etching can be performed, but tip formation and non-uniform profiles occur leading to poor manufacturing yield
Solution Approach 1:
The patent applies parameter changes by precisely controlling the concentrations of multiple chemical components (persulfate: 1-10 wt%, fluorine-containing compound: 0.1-5 wt%, chlorine-containing compound: 0.1-3 wt%, cyclic amine compound: 0.1-2 wt%, inorganic acid: 0.1-5 wt%, sulfate: 0.1-5 wt%) to achieve optimal etching uniformity and prevent tip formation. The tip control index (Y) calculated from these parameters provides a quantitative method to control etching quality.
Solution Approach 2:
The patent uses a composite etchant formulation combining multiple chemical compounds (persulfate, fluorine-containing compound, chlorine-containing compound, cyclic amine compound, inorganic acid, and sulfate) working synergistically. This composite approach allows each component to contribute different functions: persulfate for oxidation, fluorine-containing compound for metal etching, chlorine-containing compound for profile control, cyclic amine compound for complexation, inorganic acid for pH control, and sulfate for etch rate modulation, achieving both uniform etching and tip prevention.
2Productivity
If etching rate is increased to improve productivity, then manufacturing speed increases, but etch uniformity deteriorates leading to tips and defects
Solution Approach 1:
The patent resolves this contradiction through parameter changes by optimizing the concentration ratios of etching agents to uniformity controllers. The specific formulation (persulfate 1-10 wt% combined with fluorine-containing compound 0.1-5 wt%, chlorine-containing compound 0.1-3 wt%, and other components) enables high etching rates while maintaining uniform profiles. The tip control index (Y) serves as a quantitative parameter to balance etching speed and uniformity.
Solution Approach 2:
The patent introduces intermediary substances (cyclic amine compound and sulfate) that mediate between the aggressive etching agents (persulfate, fluorine-containing compound, chlorine-containing compound) and the substrate. These intermediaries moderate the etching reaction, allowing high productivity while preventing tip formation through controlled reaction kinetics and uniform material removal.
3Ease of manufacture
If etchant composition is simplified to reduce complexity, then ease of manufacture improves, but control over etch rates and tip formation deteriorates
Solution Approach 1:
The patent uses parameter changes to balance complexity and control: while the etchant contains six different chemical components, each with specific concentration ranges, the formulation provides precise control over etching parameters. The tip control index (Y) calculated from these parameters offers a quantitative method to manage complexity while achieving excellent tip control and etch uniformity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The etchant achieves efficient and uniform etching of multilayer films, reducing defect rates and improving manufacturing yield by minimizing tip occurrence and maintaining suitable taper angles, thereby enhancing the quality of display devices.
Implementation Method 1
persulfate; a fluorine-containing compound; a chlorine-containing compound; a cyclic amine compound; an inorganic acid
Implementation Method 2
An etchant composition comprising persulfate, a fluorine-containing compound, a chlorine-containing compound, a cyclic amine compound, an inorganic acid, and sulfate
Data Source
AI summary
An etchant including: persulfate; a fluorine-containing compound; a chlorine-containing compound; a cyclic amine compound; an inorganic acid; sulfate; and water, wherein a tip control index (Y) of the etchant is a value of at least about 45.0 and not more than about 70.0, the tip control index (Y) being a value calculated by Equation 1:Y=1.0×10−3×M(X1)+1.0×10−1×M(X2)+5.0×10−2×M(X3)+1.5×M(X1)×M(X2)+2.0×10−1×M(X1)×M(X3)+2.0×10−1×M(X2)×M(X3) Equation 1The description of Equation 1 is as in the specification.