Multiple Beam Writing Error Detection via Layer Comparison
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Solution Overview
Problem
Existing multiple-beam writing apparatuses face challenges in error detection due to the use of gradation data for irradiation time, which differs from the area-based error detection methods employed in single-beam systems, leading to potential degradation in writing-pattern accuracy and pattern dropout.
Innovation Solution
A data processing method that generates and corrects irradiation amount data for each layer, calculates the sum of irradiation amounts at specific positions, and compares these sums across layers to determine if an error has occurred, utilizing a controller with units for distortion, defect, and current-distribution corrections.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple beams are used for writing, then productivity is improved, but error detection capability deteriorates
Solution Approach 1:
The patent creates a virtual copy of the writing process by generating pattern data for multiple layers (first layer and second layer) that corresponds to the same physical writing area. This virtual copying enables error detection through comparison without requiring additional physical writing operations, thus maintaining productivity while improving reliability.
Solution Approach 2:
The patent implements a feedback mechanism by comparing pattern data between multiple layers to detect errors. The comparison process provides feedback about data integrity, allowing the system to identify and correct errors in the writing process while maintaining the efficiency of multiple-beam writing.
2Adaptability or versatility
If gradation data is used for irradiation time control, then writing flexibility is improved, but error detection accuracy deteriorates
Solution Approach 1:
The patent converts the gradation data control method into a comparable format by generating corresponding pattern data for multiple layers. This copying approach allows error detection while preserving the flexibility of gradation-based irradiation time control, as the underlying gradation data structure is maintained but supplemented with comparable pattern representations.
Solution Approach 2:
The patent changes the parameter used for error detection from direct gradation data comparison to pattern data comparison. This parameter transformation enables accurate error detection while maintaining the benefits of gradation-based control, as the pattern data serves as a reliable reference that can be consistently compared across layers.
3Manufacturing precision
If boundary position is shifted for multiple writing, then connection accuracy is improved, but data consistency deteriorates
Solution Approach 1:
The patent segments the writing area into multiple layers with shifted boundary positions to improve connection accuracy. By dividing the writing process into separate layers that can be independently processed and then compared, the system maintains data consistency through the comparison mechanism while achieving improved connection accuracy at boundaries.
Solution Approach 2:
The patent uses feedback from pattern data comparison to monitor and maintain data consistency across layers with shifted boundaries. The comparison process provides feedback that ensures data integrity is preserved even when boundary positions are deliberately shifted to improve connection accuracy between stripe areas.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables accurate error detection and correction in multiple-beam writing systems, ensuring consistent irradiation patterns and improved connection accuracy between stripe areas, thereby enhancing overall writing precision.
Implementation Method 1
a high-precision original pattern is written by using an electron-beam writing apparatus, in which a so-called electron-beam lithography technique is employed
Implementation Method 2
The blanking aperture array includes electrode pairs for deflecting the beams individually, and also includes openings through which the beams pass and which are disposed between the respective electrode pairs
Data Source
AI summary
In one embodiment, a data processing method is for processing data in a writing apparatus performing multiple writing by using multiple beams. The data is for controlling an irradiation amount for each beam. The method includes generating irradiation amount data for each of a plurality of layers, the irradiation amount data defining an irradiation amount for each of a plurality of irradiation position, and the plurality of layers corresponding to writing paths in multiple writing, performing a correction process on the irradiation amounts defined in the irradiation amount data provided for each layer, calculating a sum of the irradiation amounts for the respective irradiation positions defined in the corrected irradiation amount data, comparing the sums between the plurality of layers, and determining whether or not an error has occurred in the correction process based on the comparison result.