Multipole Electrostatic Lens Ion Beam Shaping
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Solution Overview
Problem
Ion implantation systems face challenges in achieving uniform ion dose and beam current profiles due to the finite size and shape of ion beams, leading to wasted ions and non-uniform substrate implantation, with existing solutions increasing the ion beam path length and footprint, and causing electron stripping that reduces beam current.
Innovation Solution
The integration of a multipole electrostatic lens system with an electrostatic scanner to shape and scan the ion beam, using oscillating and static electric fields to alter the beam's size, shape, and density, thereby improving uniformity and beam current utilization without increasing the system's footprint.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the ion beam path length is increased to improve beam shaping and uniformity, then the manufacturing precision and uniformity of ion dose improve, but the device footprint and system complexity increase
Solution Approach 1:
The patent combines the beam shaping function and beam scanning function into a single integrated apparatus by positioning the multipole electrostatic lens system within the electrostatic scanner housing. This merging allows the ion beam to be shaped and scanned simultaneously in the same spatial region, achieving uniform ion dose distribution without extending the overall beam path length or increasing system footprint.
2Manufacturing precision
If additional lens components are added to shape the ion beam, then the uniformity of ion dose improves, but the device complexity and footprint increase
Solution Approach 1:
The patent integrates the multipole electrostatic lens system within the existing electrostatic scanner housing, combining multiple functions (beam shaping and beam scanning) into a single apparatus. This eliminates the need for separate lens components and reduces overall system complexity while achieving uniform ion dose distribution.
Solution Approach 2:
The electrostatic scanner housing is designed to serve multiple functions: it provides the scanning electric field for beam deflection and simultaneously houses the multipole electrostatic lens system for beam shaping. This multi-functionality reduces the number of separate components needed in the system.
3Manufacturing precision
If the beam spot size is reduced to improve precision, then the manufacturing precision improves, but the beam current utilization decreases due to wasted ions outside substrate edges
Solution Approach 1:
The multipole electrostatic lens system creates a non-uniform electric field distribution that locally shapes the ion beam density profile. By applying different field strengths in different regions of the beam cross-section, the system concentrates ions precisely where needed on the substrate while minimizing ion waste at the beam periphery, thus improving both precision and current utilization.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach results in more uniform ion distribution across substrates, enhanced beam current utilization, and reduced electron stripping, ensuring efficient ion implantation without the need for additional components, thus improving the overall performance of ion implantation systems.
Implementation Method 1
a multipole electrostatic lens system which comprises a plurality of electrodes arranged along a portion of a path of travel of the ion beam bounded by the pair of scanning electrodes. The multipole electrostatic lens system is configured to shape the ion beam in a direction perpendicular to the first plane.
Implementation Method 2
Scanning of an ion beam may be accomplished by the use of electrostatic scanners that are employed to controllably deflect the ion beam from its normal trajectory to span a larger area by changing the electric fields in a direction perpendicular to the direction of travel of the ion beam.
Data Source
AI summary
An ion beam scanning assembly includes a set of scanning electrodes defining a gap to accept an ion beam and scan the ion beam in a first plane, and a multipole electrostatic lens system comprising a plurality of electrodes arranged along a portion of a path of travel of the ion beam bounded by the pair of scanning electrodes, the multipole electrostatic lens system configured to shape the ion beam in a direction perpendicular to the first plane.