FinFET with Multi-Threshold Fins for RF Gain

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Solution Overview

Problem

Fin field effect transistors (finFETs) face challenges in achieving high gain over a wide band and low distortion characteristics, which are essential for high-frequency applications.

Innovation Solution

The semiconductor device incorporates multiple fins with distinct threshold voltages by varying their widths and doping concentrations, allowing for a finFET configuration where the first fin, second fins, and third fins have different threshold voltages, enhancing transconductance and reducing distortion.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the gate length is decreased for miniaturization, then the integration degree is enhanced, but the cut-off characteristic of the drain current deteriorates due to the punch-through phenomenon

Engineering Contradiction:
Improveintegration degreeVSAvoidcut-off characteristic
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The channel region is divided into multiple fins that protrude from the substrate surface. By segmenting the channel into multiple vertical fins, the effective channel width is increased without increasing the planar area, allowing miniaturization while maintaining good cut-off characteristics through the fin structure's ability to suppress punch-through phenomenon.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The channel is extended into the vertical dimension by forming fins that protrude from the substrate surface. This dimensional transition from planar to vertical channel structure allows for shorter gate lengths while maintaining effective channel control and suppressing short-channel effects.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Power

If multiple fins are formed to increase drain current, then the maximum oscillation frequency and cut-off frequency are enhanced, but it becomes difficult to achieve high gain in a wide band with low distortion characteristic

Engineering Contradiction:
Improvedrain currentVSAvoiddistortion characteristic
Core Design Contradiction:
PowerVSReliability

Solution Approach 1:

Different fins are doped with different concentrations of impurity atoms, creating local variations in threshold voltage across the fin structure. This local quality differentiation allows each fin to operate at different bias conditions, enabling high gain in a wide band while reducing distortion through the combined output of fins with complementary characteristics.

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS7888751B2Semiconductor device having a fin field effect transistor
Publication Date: 2011.02.15 SONY GROUP CORP
  • US7888751B2 patent drawing
  • US7888751B2 patent drawing
  • US7888751B2 patent drawing

AI summary

A semiconductor device includes a fin field effect transistor configured to include at least a first fin and a second fin. Threshold voltage of the first fin and threshold voltage of the second fin are different from each other in the fin field effect transistor.