Nano Imprint Master with Implanted Conductive Layer
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Solution Overview
Problem
The existing methods for manufacturing nano imprint masters are costly and time-consuming due to the need for complex processes involving metal conductive layers, which also lead to non-uniform imprinting and potential damage during the nano imprinting process.
Innovation Solution
A method that implants conductive metal ions into a quartz substrate to form a conductive layer inside, allowing for the reduction of processes by eliminating the need to remove a metal conductive layer, and introducing a polymer layer as a buffer for uniform large-scale nano imprinting.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a metal conductive layer is deposited on the quartz substrate to prevent charge buildup during electron beam exposure, then charge dissipation is improved, but manufacturing complexity and time increase due to the need for subsequent metal layer removal processes
Solution Approach 1:
The patent removes the metal conductive layer from the manufacturing process entirely. Instead of depositing chromium or other metals on the quartz substrate, the invention uses a transparent conductive oxide layer that can be formed directly without subsequent removal steps, eliminating the complexity of multi-step deposition and etching processes while maintaining charge dissipation functionality
Solution Approach 2:
The patent changes the material parameter from traditional metal conductive layers to transparent conductive oxides (such as ITO, IZO, ITO, or IZO). This material substitution allows the conductive layer to remain in place after formation, eliminating the need for removal processes while maintaining both electrical conductivity and optical transparency
2Reliability
If a metal conductive layer is used to prevent charge buildup, then charge dissipation is improved, but manufacturing time and costs increase due to additional process steps
Solution Approach 1:
The patent extracts and eliminates the time-consuming metal layer removal steps from the manufacturing process. By using transparent conductive oxides that don't require removal, the process time is reduced while maintaining the charge dissipation function that would otherwise require metal layers
Solution Approach 2:
The patent changes the material parameter to transparent conductive oxides that can be formed in a single step without subsequent removal. This material parameter change eliminates multiple process steps (deposition, patterning, etching, cleaning) that would otherwise be required, significantly reducing manufacturing time and cost
3Ease of manufacture
If UV light is transmitted through the quartz substrate to cure polymer resin, then patterning is enabled, but opaque portions block UV light and prevent proper curing
Solution Approach 1:
The patent changes the optical parameter of the conductive layer by using transparent conductive oxides instead of opaque metal layers. This allows UV light to pass through the conductive layer while still maintaining electrical conductivity, solving the contradiction between needing charge dissipation and needing UV transparency for polymer curing
4Ease of operation
If the nano imprint master is separated from uncured polymer resin, then the master can be removed, but uncured resin sticks to the master and detaches with it
Solution Approach 1:
The patent applies a release layer to the quartz substrate before forming the conductive layer and patterning. This release layer is deposited in advance to prevent adhesion between the master and uncured polymer resin, allowing clean separation after the imprinting process without requiring complex removal procedures
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces manufacturing time and costs while ensuring uniformity and preventing pattern distortion, enabling efficient and large-scale nano imprinting without the need for separate metal layer removal.
Implementation Method 1
implants conductive metal ions into a quartz substrate to form a conductive layer inside
Implementation Method 2
transparent quartz or glass is used in forming a master substrate used in nano imprinting. This is because UV light must be delivered to and transmitted through both a portion in which patterns of the nano imprint master are formed
Implementation Method 3
when ultraviolet (UV) light is irradiated, a polymer resin formed on the substrate 10 is molten
Implementation Method 4
UV light must be delivered to and transmitted through both a portion in which patterns of the nano imprint master are formed so that the polymer resin can be cured
Data Source
AI summary
A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.