Nano Measurement Scale Calibration Using Certified Nanostructures
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Solution Overview
Problem
Current microscopes, such as AFM and SEM, face challenges in accurately measuring nanoscale dimensions due to deviations between measured and actual values, especially as semiconductor device sizes decrease, requiring a precise calibration method to define these differences effectively.
Innovation Solution
A method involving a standard material with nanostructures of certified values of different sizes, alternately stacked with intermediate layers, is used to calibrate the microscope's measurement scale by measuring widths and determining deviations, allowing for linear fitting and calibration of measured values to minimize offset.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a microscope measures nanoscale dimensions in semiconductor manufacturing, then measurement capability is achieved, but measurement precision deteriorates due to deviations between measured and actual values
Solution Approach 1:
The patent applies preliminary action by creating a standard material with pre-defined certified values before actual measurements are performed. The standard material includes nanostructures with precisely controlled widths (5-100 nm) that serve as reference standards, allowing the microscope to be calibrated beforehand to eliminate measurement deviations and improve both precision and reliability
Solution Approach 2:
The patent applies parameter changes by systematically varying the width parameters of nanostructures in the standard material (ranging from 5 nm to 100 nm in 5 nm increments). This creates a series of reference structures with different dimensional parameters, enabling the microscope to be calibrated across the full measurement range and improving measurement precision for various nanoscale features
2Productivity
If semiconductor device sizes are reduced to improve productivity, then device performance is enhanced, but measurement precision deteriorates due to smaller feature sizes
Solution Approach 1:
The patent addresses this contradiction by creating a standard material that spans the full range of semiconductor feature sizes (5-100 nm widths). This allows microscopes to be calibrated for measuring progressively smaller features, enabling continued productivity improvements through device miniaturization while maintaining measurement precision through proper calibration against appropriate-sized reference structures
Solution Approach 2:
The patent applies segmentation by dividing the standard material into multiple nanostructures with different width categories (5-100 nm range). This segmented approach allows selective use of appropriately-sized reference structures for calibrating measurements of specific device features, ensuring measurement precision is maintained even as device sizes decrease
Data Source
AI summary
Provided is a method of calibrating a nano measurement scale using a standard material including: measuring widths of a plurality of nanostructures included in the standard material and having pre-designated certified values of different sizes by a microscope; determining measured values for the widths of each of the plurality of nanostructures measured by the microscope based on a predetermined criterion; and calibrating a measurement scale of the microscope based on the certified values and the measured values.