Nanoimprint Substrate Patterning for Large-Area Nano Displays
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Solution Overview
Problem
Current nanoimprint substrates are limited in size due to manufacturing methods like electron beam direct writing and laser interference, making it challenging to produce large-sized nanoimprint substrates with nano patterns.
Innovation Solution
A method involving multiple imprinting using a small-sized nanoimprint template to create a large-sized imprint template, and subsequently forming nano patterns on a base substrate by forming a pattern transfer layer with multiple imprint regions, performing patterning processes to create sequential imprint patterns, and using protective layers to expose and protect the pattern transfer layer regions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If electron beam direct writing or laser interference methods are used to manufacture nanoimprint substrates, then high resolution nano patterns can be achieved, but the substrate size is limited and cannot produce large-sized substrates
Solution Approach 1:
The base substrate is divided into multiple imprint regions, each capable of receiving nano patterns independently. This segmentation allows the overall substrate size to be expanded beyond the limitations of single-pattern methods while maintaining high resolution in each region through sequential patterning processes
Solution Approach 2:
The invention transitions from a single-plane patterning approach to a multi-region sequential patterning approach. By organizing multiple imprint regions on the same substrate and patterning them in sequence with protective layers, the method effectively adds a temporal dimension to the patterning process, enabling large substrate areas to be covered while maintaining nanometer-scale precision
2Area of stationary object
If multiple patterning processes are performed sequentially on different imprint regions, then large-sized substrates can be manufactured, but the process complexity increases with protective layer formation and removal
Solution Approach 1:
Protective films are formed in advance before each patterning step to protect regions that have already been patterned. This preliminary protective action prevents damage to completed patterns during subsequent etching processes, enabling sequential patterning without compromising previously formed nano structures
Solution Approach 2:
Protective films serve as intermediary layers between different patterning steps. These films temporarily cover regions that should not be modified during a particular patterning operation, allowing precise control over which regions receive patterns at each step while simplifying the overall process management
3Area of stationary object
If a small-sized nanoimprint template is used to create large-sized substrates through multiple imprinting, then large substrate area is achieved, but the manufacturing time and process steps increase
Solution Approach 1:
The sequential patterning process continuously forms nano patterns across different imprint regions without interrupting the overall manufacturing flow. Each patterning step immediately follows the previous one with protective layer management, maintaining continuous productive action across the entire substrate area rather than requiring repeated template fabrication or substrate replacement
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the manufacturing of large-sized nanoimprint substrates and display substrates with precise nano patterns, improving the efficiency and accuracy of nano pattern formation while maintaining the high resolution and low cost advantages of nanoimprint technology.
Implementation Method 1
transfering a template pattern to a substrate by using an imprint template with micro-nano structure by contact imprinting due to the action of mechanical external force
Data Source
AI summary
A method for manufacturing a nano pattern, includes: forming a pattern transfer layer on a base substrate having N imprint regions, and performing patterning processes on the pattern transfer layer to form an imprint pattern layer. A portion of the imprint pattern layer located in each imprint region is an imprint pattern, N imprint patterns are formed sequentially. Forming an i-th imprint pattern in an i-th imprint region includes: performing a patterning process on a portion of the pattern transfer layer located in the i-th imprint region to form the i-th imprint pattern; forming an i-th protective film on a side of the pattern transfer layer away from the base substrate; and removing at least a portion of the i-th protective film located in an (i+1)-th imprint region to obtain an i-th protective layer and expose a portion of the pattern transfer layer located in the (i+1)-th imprint region.