Nanoimprint Template Separation Pressure Control

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Solution Overview

Problem

The existing nanoimprinting pattern forming methods often result in defects due to the template pulling out part of the resist during separation, particularly due to varying density distributions of the pattern, which affects the proper formation of patterns.

Innovation Solution

The method involves contacting a template with an imprint material on a substrate, curing it, and then separating the template while applying pressure to the back surface, using a load measuring section and gas control to maintain a constant load or separation speed, thereby preventing defects.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the template is separated from the resist without applying pressure to the back surface, then the separation process is simple, but the template pulls out part of the resist causing defects

Engineering Contradiction:
Improvepattern formation qualityVSAvoidseparation process complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The invention changes the physical parameter of pressure applied to the back surface of the template during separation. By controlling pressure to be 0.1-1.0 MPa, the template maintains stable contact with the resist while preventing excessive adhesion forces that would cause resist pull-out, thus improving pattern formation quality without complexifying the separation mechanism

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention performs preliminary action by pre-applied pressure to the back surface of the template before actual separation occurs. This preliminary pressure application ensures that the template is ready to maintain optimal contact with the resist throughout the separation process, preventing resist pull-out defects from the outset

Inventive Principle:
Principle #10Preliminary action

2Manufacturing precision

If pressure is applied to the back surface of the template during separation, then resist pull-out is prevented, but the separation process becomes more complex

Engineering Contradiction:
Improvepattern formation precisionVSAvoidseparation operation simplicity
Core Design Contradiction:
Manufacturing precisionVSEase of operation

Solution Approach 1:

The invention optimizes the pressure parameter to a specific range (0.1-1.0 MPa) that achieves the dual goal of preventing resist pull-out while maintaining operational simplicity. This controlled pressure application allows the template to separate cleanly from the resist without requiring complex mechanical systems

Inventive Principle:
Principle #35Parameter changes

3Productivity

If the template separates rapidly from the resist, then the process time is reduced, but adhesion variations cause defects

Engineering Contradiction:
Improvepattern forming speedVSAvoidpattern consistency
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The invention changes the pressure parameter during separation to control the separation speed and maintain consistency. By applying pressure in the range of 0.1-1.0 MPa, the separation process proceeds at an optimal speed that prevents resist pull-out while maintaining pattern consistency, balancing productivity with reliability

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach ensures consistent pattern formation by controlling the load or separation speed during template separation, reducing the likelihood of defects caused by rapid changes in adhesion between the template and resist.

Implementation Method 1

applying pressure to the back surface of the template

Methodology Applied
Scientific EffectPressure: Pressure Increase

Implementation Method 2

the resist is irradiated with light and thus cured

Methodology Applied
Scientific EffectCuring: Photopolymerisation

Data Source

PatentUSRE47093E1Imprint pattern forming method
Publication Date: 2018.10.23 KIOXIA CORP
  • USRE47093E1 patent drawing
  • USRE47093E1 patent drawing
  • USRE47093E1 patent drawing

AI summary

An imprint pattern forming method includes contacting a template with a pattern in a front surface with an imprint material formed in a substrate to fill the imprint material into the pattern, curing the imprint material filled in the pattern to form an imprint material pattern, and after forming the imprint material pattern, separating the template from the imprint material pattern while applying pressure to the back surface of the template.