Nanoparticle Detection via Fluorescence and Raman Spectroscopy

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Solution Overview

Problem

Current liquid particle counters (LPCs) struggle to accurately determine nanoparticle counts and surface properties in semiconductor manufacturing processes due to agglomeration and inability to deduce particle nature or chemistry, especially for particles smaller than 50 nm.

Innovation Solution

The implementation of an optical apparatus configured to measure fluorescence and Raman signals, using an electron multiplying charged couple device and grating spectrometer, along with a microfluidic flow cell and tunable diode-pumped solid-state laser, to chemically identify and quantify nanoparticles, accounting for zeta potential and agglomeration effects.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If liquid particle counter (LPC) tools are used to detect nanoparticle count, then particle count can be determined, but nanoparticle agglomeration causes false particle count and surface properties cannot be measured

Engineering Contradiction:
Improvenanoparticle count accuracyVSAvoidsurface properties information
Core Design Contradiction:
Measurement precisionVSLoss of information

Solution Approach 1:

The patent combines multiple measurement techniques (LPC for particle counting, zeta potential measurement for surface charge, and chemical analysis) into a single integrated system. This allows simultaneous acquisition of particle count, surface properties, and chemical composition data, resolving the contradiction by merging previously separate measurement functions into one comprehensive apparatus that eliminates information loss while maintaining counting accuracy.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The invention creates a multi-functional measurement system that can perform particle counting, zeta potential measurement, and chemical analysis using a single apparatus. This universal tool addresses the limitation of LPC tools by adding surface property measurement capabilities without sacrificing particle count detection, allowing one device to serve multiple analytical purposes.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Measurement precision

If LPC tools based on dynamic light scattering are used, then particle size distribution can be recorded, but the nature or chemistry of contaminant particles cannot be deduced

Engineering Contradiction:
Improveparticle size distributionVSAvoidchemical composition information
Core Design Contradiction:
Measurement precisionVSLoss of information

Solution Approach 1:

The patent merges light scattering-based particle size measurement with chemical analysis capabilities in a single system. By combining these previously separate functions, the apparatus can simultaneously determine particle size distribution and identify chemical composition, preventing loss of chemical information while maintaining accurate size measurement.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The measurement process is segmented into distinct functional modules: particle size detection via light scattering, zeta potential measurement for surface properties, and chemical analysis. Each module handles a specific aspect of particle characterization, allowing comprehensive analysis while maintaining the strengths of each individual technique without interference.

Inventive Principle:
Principle #1Segmentation

3Ease of manufacture

If traditional cleaning processes are used, then simple cleaning can be performed, but nanoparticles less than 50 nm in diameter cannot be effectively removed

Engineering Contradiction:
Improvecleaning process simplicityVSAvoidnanoparticle removal effectiveness
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The invention changes key parameters of the cleaning process by incorporating zeta potential measurement and chemical analysis to optimize cleaning solution formulation. By adjusting pH, ionic strength, and chemical composition based on measured particle properties, the cleaning process becomes highly effective against nanoparticles while maintaining operational simplicity through automated control.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The system implements feedback control by measuring particle characteristics (size, zeta potential, composition) and using this information to adjust cleaning parameters in real-time. This feedback mechanism ensures reliable nanoparticle removal while keeping the process simple through automated adjustment rather than manual optimization.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach provides improved nanoparticle count information and chemical characterization, enabling more efficient cleaning solutions by determining the nature and charge of nanoparticles, thus enhancing the removal of contaminants from semiconductor processing tools.

Implementation Method 1

contacting the effluent comprising one or more insoluble analytes-of-interest with an optical apparatus configured to measure fluorescence

Methodology Applied
Scientific EffectFluorescence: Fluorescence

Implementation Method 2

contacting the effluent comprising one or more insoluble analytes-of-interest with an optical apparatus configured to measure fluorescence and, optionally Raman signals

Methodology Applied
Scientific EffectRaman scattering: Scattering

Implementation Method 3

tunable diode-pumped solid-state laser

Methodology Applied
Scientific EffectLaser: Laser

Implementation Method 4

grating spectrometer to spectrally disperse the fluorescence

Methodology Applied
Scientific EffectDiffraction grating: Diffraction Grating

Data Source

PatentUS11280717B2Methods and apparatus for detection and analysis of nanoparticles from semiconductor chamber parts
Publication Date: 2022.03.22 APPLIED MATERIALS INC
  • US11280717B2 patent drawing
  • US11280717B2 patent drawing
  • US11280717B2 patent drawing

AI summary

Methods and apparatuses for identifying contaminants in a semiconductor cleaning solution, including: contacting a semiconductor cleaning solution with a semiconductor manufacturing component to form an effluent including one or more insoluble analytes-of-interest; contacting the effluent including one or more insoluble analytes-of-interest with an optical apparatus configured to sense fluorescence and, optionally, Raman signals from the one or more insoluble analytes-of-interest, wherein the apparatus includes an electron multiplying charged couple device and a grating spectrometer to spectrally disperse the fluorescence and project the fluorescence on to the electron multiplying charged couple device; and identifying the one or more analytes of interest.