Nanoparticle Detection Thresholds Using Histogram Local Minima

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Solution Overview

Problem

Current ICP mass spectroscopy techniques face challenges in accurately determining nanoparticle baselines and detection thresholds due to overlap with background interference from plasma gases, leading to unreliable data on nanoparticle identification and size distribution.

Innovation Solution

The method involves generating spectrometry data sets from ion signal intensity over time, iteratively removing outlier values, and setting nanoparticle baselines and detection thresholds using multiple data processes to differentiate between nanoparticle signals and background interference, with processes including iterative outlier removal and local minimum analysis.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If traditional ICP mass spectroscopy techniques are used to determine nanoparticle baselines and detection thresholds, then the analysis can be performed with standard methods, but the results are unreliable due to overlap with background interference from plasma gases

Engineering Contradiction:
Improvenanoparticle baseline determination accuracyVSAvoidnanoparticle identification reliability
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The patent segments the spectrometry data into distinct components by analyzing count distributions and identifying local minima. The data is divided into background interference regions and nanoparticle signal regions, allowing separate characterization and more accurate baseline determination without contamination from plasma gas interference.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent applies local quality analysis by examining local minimum values in the count distribution histogram rather than using global statistical measures. This local approach allows the detection threshold to be determined at specific regions where background interference and nanoparticle signals are naturally separated, improving both precision and reliability.

Inventive Principle:
Principle #3Local quality

2Ease of manufacture

If standard deviation-based outlier removal is used to establish baselines, then the process is computationally simple, but it fails to account for non-Gaussian distributions and produces inaccurate thresholds

Engineering Contradiction:
Improvedata processing simplicityVSAvoiddetection threshold accuracy
Core Design Contradiction:
Ease of manufactureVSMeasurement precision

Solution Approach 1:

The patent replaces the mechanical/statistical approach of standard deviation-based outlier removal with a histogram analysis approach that identifies local minimum values. This substitution allows the method to handle non-Gaussian distributions effectively while maintaining computational efficiency through algorithmic optimization.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the fundamental parameter used for threshold determination from standard deviation (a global statistical measure) to local minimum values in the count distribution histogram. This parameter change enables accurate threshold detection in non-Gaussian distributions while keeping the computational process straightforward.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach provides reliable determination of nanoparticle baselines and detection thresholds, effectively distinguishing between nanoparticle signals and background interference, thereby improving the accuracy of nanoparticle identification and size distribution analysis.

Implementation Method 1

ICP mass spectroscopy employs electromagnetically generated partially ionized argon plasma which reaches a temperature of approximately 7000K. When a sample is introduced to the plasma, the high temperature causes sample atoms to become ionized or emit light.

Methodology Applied
Scientific EffectIonization: Ionisation

Data Source

PatentUS20230352289A1Nanoparticle detection threshold determination through local minimum analysis
Publication Date: 2023.11.02 ELEMENTAL SCI
  • US20230352289A1 patent drawing
  • US20230352289A1 patent drawing
  • US20230352289A1 patent drawing

AI summary

Systems and methods are described for analyzing local minimum data from spectrometry data for the determination of nanoparticle detection thresholds are described. In aspects, a histogram of the spectrometry data is used to search for potential local minimum values, which are subsequently validated to establish a nanoparticle detection threshold for the spectrometry data, with ion intensity values less than the nanoparticle detection threshold being attributable to signal background.