Neural Network Training for Library-Based CD Metrology
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Solution Overview
Problem
Current methods for library-based critical dimension (CD) metrology in optical metrology are time-consuming and inefficient, particularly in accurately training neural networks for characterizing semiconductor structures, due to the need for large numbers of neurons and iterations, which can lead to overtraining and high computational costs.
Innovation Solution
The approach optimizes the training of neural networks by dynamically adjusting the number of neurons and using a modified Levenberg-Marquardt algorithm, along with principal component analysis (PCA) threshold optimization, to create a high-accuracy spectral library with reduced computational requirements, enabling faster and more accurate CD metrology.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the number of diffraction orders is increased to improve simulation accuracy, then the accuracy of RCWA solution is improved, but the computation time increases nonlinearly
Solution Approach 1:
The patent performs preliminary determination of the optimal number of diffraction orders before executing the full RCWA simulation. By pre-calculating which diffraction orders contribute significantly to the solution based on convergence criteria, the system avoids unnecessary computations of higher-order terms that would increase computation time without improving accuracy. This preliminary action resolves the contradiction by establishing the appropriate level of detail beforehand.
Solution Approach 2:
The patent implements a strategy where diffraction orders are included progressively until a convergence threshold is met, rather than including all possible orders. This partial action approach includes only the necessary number of diffraction orders required to achieve the desired accuracy, excluding excessive higher-order terms that would waste computational resources. The system performs partial computation with sufficient orders rather than exhaustive computation with all possible orders.
2Measurement precision
If a large number of neurons and iterations are used in neural network training to improve accuracy, then the precision of CD metrology is improved, but the training time and computational resources increase
Solution Approach 1:
The patent performs preliminary determination of the optimal number of neurons and iteration count before executing full neural network training. By pre-assessing the complexity of the spectral library and the required accuracy level, the system calculates the sufficient number of neurons and iterations needed, avoiding both under-training and over-training. This preliminary configuration resolves the contradiction by establishing appropriate training parameters beforehand.
Solution Approach 2:
The patent implements feedback mechanisms during neural network training where the system monitors convergence metrics and adjusts the number of iterations and neurons dynamically. If the training achieves the desired accuracy earlier than expected, the system terminates training early, avoiding unnecessary iterations. This feedback control ensures that computational resources are used efficiently while maintaining the required precision for CD metrology.
Data Source
AI summary
Embodiments are generally directed to neural network training for library-based critical dimension metrology. An embodiment of a method includes optimizing a threshold for a principal component analysis of a spectrum data set to provide a principal component value, estimating a training target for one or more neural networks, training the one or more neural networks based both on the training target and on the principal component value provided from optimizing the threshold for the principal component analysis, and providing a spectral library based on the one or more trained neural networks.


