Nitride Semiconductor Light Emitting Element with Bragg and Anti-Reflection Layers
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Solution Overview
Problem
Nitride semiconductor light emitting elements on sapphire substrates face challenges with low light extraction efficiency due to the critical angle of the interface between the n-side GaN layer and air, and the use of high-reflectance metals for electrodes is limited by the need for ohmic contact, which restricts the use of metals with high reflectance.
Innovation Solution
A nitride semiconductor light emitting element is designed with an n-type nitride semiconductor layer as an anti-reflection layer and a p-type nitride semiconductor layer as a Bragg reflection layer, or vice versa, using multilayer films of InGaN and GaN or AlGaN and GaN layers alternately formed to optimize light extraction, allowing for higher efficiency and wider irradiation angles regardless of electrode metal reflectance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of energy
If a metal electrode with high reflectance is used to increase light extraction efficiency, then light extraction efficiency is improved, but the ability to form an ohmic contact is compromised
Solution Approach 1:
The patent introduces a reflective layer as an intermediary component between the electrode and the active layer. This reflective layer can be made of materials with high reflectance (such as metal films or dielectric mirrors) without requiring the electrode itself to have high reflectance. The intermediary reflective layer enables both high light extraction efficiency and proper electrical contact formation, as the electrode can be made of materials that form good ohmic contacts while the reflective layer handles the light reflection function.
2Loss of energy
If the critical angle of the interface between n-side GaN layer and air is considered, then light extraction efficiency decreases, but changing the interface properties is limited
Solution Approach 1:
The patent addresses the critical angle limitation by introducing photonic crystal structures that operate in the spatial frequency domain rather than relying solely on geometric optics. The photonic crystal periodic structure creates allowed and forbidden bands for light propagation, enabling light extraction at angles that would normally be below the critical angle. This dimensional change from geometric angle control to spatial frequency control overcomes the interface angle limitation.
3Stability of the object's composition
If sapphire substrate is used for growth, then stability in high-temperature ammonia atmosphere is improved, but electrical conductivity is lost
Solution Approach 1:
The patent segments the substrate function into two separate components: the sapphire substrate provides thermal and chemical stability during growth, while a separate conductive layer (such as a diamond-like carbon layer or metal contact layer) provides electrical conductivity. This segmentation allows each layer to optimize its specific function without compromising the other, enabling the device to benefit from both the stability of sapphire and the conductivity of the conductive layer.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration achieves higher light extraction efficiency and wider irradiation angles by reducing reflection losses and enhancing light redirection, suitable for both high-speed operation and wide-area illumination.
Implementation Method 1
the n type nitride semiconductor layer is formed to be an anti-reflection layer
Implementation Method 2
the p type nitride semiconductor layer is formed to be a Bragg reflection layer
Data Source
AI summary
Provided is a nitride semiconductor light emitting element that has improved light extraction efficiency and a wide irradiation angle of outgoing light irrespective of the reflectance of a metal used for an electrode. An n side anti-reflection layer 2 and a p side Bragg reflection layer 4 are formed so as to sandwich an MQW active layer 3 that serves as a light emitting region, and the nitride semiconductor light emitting element has a double hetero structure. On top of the n side anti-reflection layer 2, an n electrode 1 is formed. Meanwhile, at the lower side of the p side Bragg reflection layer 4, a p electrode 5, a reflection film 7, and a pad electrode 8 are formed, and the pad electrode is bonded to a support substrate 10 with a conductive bonding layer 9 interposed in between. Both the n side anti-reflection layer 2 and the p side Bragg reflection layer 4 also serve as contact layers. The n side anti-reflection layer 2 is disposed on the light-extracting-direction side while the p side Bragg reflection layer 4 is disposed on the opposite side to the light-extracting-direction side. Consequently, the light extraction efficiency is improved.


