Non-volatile Memory Array Area Reduction via Segmented Active Regions

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Solution Overview

Problem

Existing non-volatile memory arrays face challenges in reducing manufacturing costs and increasing packing density due to the need for separated active regions to avoid writing errors, which increases the total area of the memory array.

Innovation Solution

The non-volatile memory array design features poly regions of adjacent bit cells extending over different pairs of active regions when sharing a bit line, allowing for continuous parallel extension of active regions without separating them, thereby preventing writing errors and reducing the overall area.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If active regions are separated to avoid writing errors, then writing reliability is improved, but the total area of the memory array increases

Engineering Contradiction:
Improvewriting reliabilityVSAvoidtotal area of memory array
Core Design Contradiction:
ReliabilityVSArea of stationary object

Solution Approach 1:

The patent segments the bit cell structure by assigning different active region pairs to adjacent bit cells sharing a bit line. Specifically, first bit cells share a first pair of active regions while second bit cells share a second pair of active regions, allowing spatial separation of write operations without physical isolation structures. This segmentation enables reliable writing to selected bit cells while preventing unintended writes to adjacent cells, resolving the contradiction between writing reliability and area efficiency.

Inventive Principle:
Principle #1Segmentation

2Reliability

If isolation elements are used to prevent writing errors, then writing reliability is improved, but device complexity and manufacturing cost increase

Engineering Contradiction:
Improvewriting reliabilityVSAvoidstructure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent extracts and eliminates the need for isolation elements (such as deep trenches or thick dielectric layers) by implementing a layout architecture where adjacent bit cells naturally isolate write operations through their distinct active region assignments. By taking out these complex isolation structures and replacing them with a simplified active region pairing scheme, the invention reduces device complexity and manufacturing cost while maintaining writing reliability through the segmented active region architecture.

Inventive Principle:
Principle #2Taking out (Extraction)

3Area of stationary object

If continuous parallel extension of active regions is implemented, then area efficiency is improved, but writing errors may occur between adjacent bit cells

Engineering Contradiction:
Improvearea efficiencyVSAvoidwriting accuracy
Core Design Contradiction:
Area of stationary objectVSReliability

Solution Approach 1:

The patent applies local quality by assigning different active region configurations to different groups of bit cells. Specifically, first bit cells are configured with a first pair of active regions while second bit cells use a second pair of active regions, creating localized structural differences that prevent writing errors. This local differentiation allows continuous parallel extension of active regions for area efficiency while ensuring writing accuracy through group-specific active region assignments that isolate write operations to intended bit cells only.

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS10784276B2Non-volatile memory and method of manufacturing same
Publication Date: 2020.09.22 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US10784276B2 patent drawing
  • US10784276B2 patent drawing
  • US10784276B2 patent drawing

AI summary

A semiconductor device is provided. The semiconductor device comprises a first active region, a second active region and a third active region, a first poly region, a second poly region, a third poly region, a first doped region and a second doped region. The first active region, the second active region and the third active region are separated and parallel with each other. The first poly region is arranged over the first and second active regions. The second poly region is arranged over the first and second active regions. The third poly region is arranged over the second and third active regions. The first doped region is in the second active region and between the first poly region and the second poly region. The second doped region is in the second active region and between the second poly region and the third poly region.