Norbornene Polymer Films for High-Aspect-Ratio Aqueous Development
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Solution Overview
Problem
Current norbornene-type polymer compositions are limited in forming thick, highly transparent films with low permittivity and high heat resistance suitable for advanced microelectronic and optoelectronic devices, particularly due to limitations in aspect ratio and solvent requirements for image development.
Innovation Solution
Development of norbornene-type polymer compositions that are self-imagable, using a 2,3 enchainment polymerization process with specific repeating units and additives, allowing for image-wise exposure and aqueous base development to achieve films with aspect ratios greater than 6:1 and thicknesses of 30 μm or more, while maintaining transparency and heat resistance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If solvent-based image development process is used for negative-tone norbornene-type polymer, then thick self-imagable films (≥30 μm) can be formed, but the process differs from the commonly employed aqueous base development process
Solution Approach 1:
The patent modifies the chemical parameters of the norbornene-type polymer by incorporating specific functional groups (carboxylic acid groups with pKa < 11) that enable the polymer to be developed using aqueous base solutions. This parameter change allows the polymer to achieve both thick film formation capability and compatibility with the standard aqueous base development process used in semiconductor manufacturing.
2Temperature
If polyimide resins are used, then high temperature performance is adequate, but permittivity is not low enough for highly integrated devices with increased wiring density and high signal speed
Solution Approach 1:
The patent creates a composite material system by combining norbornene-type polymer backbone structures with specific functional group substitutions (carboxylic acid groups). This composite approach achieves both the required thermal stability for high-temperature processing and the low permittivity necessary for high-speed signal transmission in densely integrated circuits, overcoming the limitations of conventional polyimide resins.
3Temperature
If polyimide resins are used, then high temperature performance is adequate, but transparency is not sufficient for optical applications
Solution Approach 1:
The patent applies local quality by maintaining the thermal stability characteristics in the polymer backbone structure while introducing optically transparent functional groups (carboxylic acid groups) as side-chain modifications. This localized differentiation allows the material to exhibit both high temperature resistance and superior transparency, making it suitable for optical applications where polyimide resins fall short.
4Illumination intensity
If acrylic resin or alicyclic olefin resin is used, then transparency is adequate, but heat resistance is not sufficient to withstand subsequent processing
Solution Approach 1:
The patent fundamentally changes the thermal parameters of transparent resin systems by employing the norbornene-type polymer structure with carboxylic acid functional groups. This structural modification raises the glass transition temperature and thermal stability to levels sufficient for withstanding subsequent semiconductor processing steps, while preserving the optical transparency required for optical device applications.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The polymer compositions enable the formation of high-aspect-ratio, thick films with improved transparency and heat resistance, suitable for advanced microelectronic and optoelectronic applications, using an aqueous base developer, which surpasses the limitations of existing materials.
Implementation Method 1
Upon image-wise exposure of a film formed of such a composition followed by development of the images, a crosslinked polymer matrix is formed within those portions of the film that have been exposed to the actinic radiation
Data Source
AI summary
Embodiments in accordance with the present invention encompass negative-tone, aqueous base developable, self-imagable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.