Photosensitive Materials TRIZ Cases
- Photosensitive Resin Composition for High Aspect Ratio Micro Resist Patterns
A photosensitive resin composition incorporating specific solvents and initiators to achieve high sensitivity and resolving ability.
- Resist Composition with Polymeric Acid Generator for Lithography
A resist composition uses a polymeric acid generator to achieve high sensitivity and resolution.
- Optically Isotropic Polyester Film via Melt-Extrusion
Replacing solvent casting with melt-extrusion of cyclic acetal polyester eliminates residual solvents while achieving optical isotropy.
- Positive Resist Composition for ArF Lithography
Composite resist reduces line width roughness and outgas generation while maintaining etching resistance.
- Positive Resist Composition for High-Resolution Lithography
A positive resist composition uses hydroxystyrene units and acid generators to form precise patterns.
- Fluorinated Silicon Resin Composition for Liquid Immersion Lithography
A radiation-sensitive resin composition incorporating fluorine and silicon atoms to improve pattern formation quality.
- Catalyst Precursor Resin for Electroless Plating Micro Patterns
Fluorinated silver ion complex in copolymer resin reduces catalyst loss during wet processing to form homogeneous micro patterns.
- Novolak Protective Film for EUV Lithography OOB Light
Novolak protective film absorbs out-of-band light to prevent thickness loss while enabling simultaneous stripping.
- Polymeric Compound Copolymerization for Resist Pattern Defects
Adding a basic compound during copolymerization prevents decomposition of acid decomposable groups, reducing defects in resist films.
- Benzalkonium Chloride Resist Treatment for LWR Reduction
Heating and rinsing a resist pattern with benzalkonium chloride reduces line width roughness without altering the precise pattern dimensions.
- Chemically Amplified Resist Composition for High-Resolution Lithography
Novolak and polyhydroxystyrene resin system with vinyl ether structures enables precise pattern formation in semiconductor manufacturing.
- Supercritical Processing for Lithography Resist Patterns
A supercritical processing solution introduces organic compounds into resist films before exposure to enhance sensitivity and etching resistance.
- Silicon-Containing Film Composition for Semiconductor Patterning
Composite silicon film suppresses photolithography reflection and maintains shelf stability through acid-catalyzed hydrolytic condensation.
- Immersion Lithography Resist Composition for Defect Reduction
A positive resist composition using silicon-free and silicon-containing resins enables uniform chemical reactions during immersion lithography exposure.
- Optical Waveguide Refractive Index Profile for Crosstalk Reduction
Segmented cladding layers and a graded-index core reduce transmission loss and pulse distortion caused by narrow channel pitch.
- Resist Composition Acid Generator for Lithography Pattern Fidelity
A divalent linking group connects acid-generating moieties in a resist composition to enhance lithography properties.
- Novel Copolymer for EUV Resist with Controlled Molecular Weight
A novel copolymer structure enables high sensitivity and resolution in lithography applications.
- Polymerizable Composition for Direct Imaging Lithography
A radical polymerizable composition with high-dipole binder polymers enables direct plate-making using UV or infrared lasers.
- Positive Tone Photosensitive Resin Composition for Low-Temperature Hardening
A positive tone photosensitive composition uses a modified phenol resin and thermal cross-linker to enhance sensitivity and resolution.