Offset Vertical NAND Channels for Memory Density

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Solution Overview

Problem

Current vertical NAND channel configurations in non-volatile memory devices limit the density and efficiency of memory cells due to alignment constraints, which restricts the packing density and read/write performance.

Innovation Solution

The arrangement of vertical NAND channels in an offset configuration within select gate lines allows for closer packing and increased density, enabling more channels to be activated by a single select gate line, thereby enhancing page size and read/write performance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If vertical NAND channels are arranged in a traditional aligned configuration, then the structure is simple to manufacture, but the packing density and memory cell density are limited

Engineering Contradiction:
Improvememory cell densityVSAvoidchannel arrangement complexity
Core Design Contradiction:
Quantity of substanceVSDevice complexity

Solution Approach 1:

The patent applies asymmetry by offsetting alternate vertical NAND channels from their aligned positions. Specifically, even-numbered channels are offset in a first direction while odd-numbered channels are offset in a second direction, creating an asymmetric pattern that increases packing density within the select gate line area without requiring complex manufacturing process changes

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The patent introduces a lateral offset dimension to the traditionally vertically-aligned channel structure. By displacing channels in the lateral direction (parallel to the select gate line) rather than maintaining strict vertical alignment, the design utilizes an additional spatial dimension to achieve higher density while keeping the vertical stacking architecture intact

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Productivity

If vertical NAND channels are offset to increase packing density, then more channels can be activated by a single select gate line, but the alignment precision requirements increase

Engineering Contradiction:
Improveread/write performanceVSAvoidchannel alignment precision
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent segments the vertical NAND channels into alternating groups (even-numbered and odd-numbered channels) that are offset in opposite directions. This segmentation allows each group to be independently positioned, enabling precise control over the offset pattern and facilitating the activation of more channels by a single select gate line while maintaining manufacturability

Inventive Principle:
Principle #1Segmentation

3Quantity of substance

If channels are spaced closer together to increase density, then memory cell density improves, but interference between adjacent channels may increase

Engineering Contradiction:
Improvechannel packing densityVSAvoidchannel interference
Core Design Contradiction:
Quantity of substanceVSObject-affected harmful factors

Solution Approach 1:

The asymmetric offset pattern creates alternating regions where even channels are shifted in one direction and odd channels in the opposite direction. This asymmetry distributes the lateral spacing variations throughout the structure, preventing concentrated interference zones while maintaining overall high density, as adjacent offset channels are separated by the offset distance rather than being directly adjacent

Inventive Principle:
Principle #4Asymmetry

Data Source

PatentUS9899401B2Non-volatile memory devices including vertical NAND channels and methods of forming the same
Publication Date: 2018.02.20 SAMSUNG ELECTRONICS CO LTD
  • US9899401B2 patent drawing
  • US9899401B2 patent drawing
  • US9899401B2 patent drawing

AI summary

A non-volatile memory device can include a plurality of immediately adjacent offset vertical NAND channels that are electrically coupled to a single upper select gate line or to a single lower select gate line of the non-volatile memory device.