OLED Array Substrate Single Patterning Process
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Solution Overview
Problem
The manufacturing process for OLED array substrates is complex due to the need for multiple masking steps in forming patterns of interlayer dielectric layers, sources, drains, and pixel electrodes, which complicates the overall process.
Innovation Solution
A method that forms patterns of interlayer dielectric layers, sources, and pixel electrodes through a single patterning process using halftone or gray-tone masks, reducing the number of masking steps required and simplifying the process by using a composite conductive film of aluminum neodymium alloy and indium tin oxide for the electrodes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple masking steps are used to form patterns of interlayer dielectric layer, source, drain, and pixel electrode, then the manufacturing precision is improved, but the device complexity and manufacturing time increase
Solution Approach 1:
The patent combines multiple patterning operations into a single masking step. Specifically, it forms patterns of the interlayer dielectric layer, source, drain, and pixel electrode simultaneously through one masking process, eliminating the need for separate masking steps for each component. This merging approach maintains manufacturing precision while significantly reducing process complexity and the number of steps required.
Solution Approach 2:
The single mask plate used in the invention serves multiple functions: it defines patterns for the interlayer dielectric layer, source, drain, and pixel electrode all at once. This multi-functional mask plate replaces what would traditionally require multiple specialized mask plates, each designed for a specific patterning operation, thereby simplifying the overall manufacturing process.
2Manufacturing precision
If multiple masking steps are performed, then the pattern formation accuracy is improved, but the productivity decreases
Solution Approach 1:
The patent merges multiple sequential patterning operations into a single simultaneous operation. By forming all required patterns (interlayer dielectric layer, source, drain, pixel electrode) in one masking and etching cycle, it eliminates the cumulative time losses associated with multiple discrete steps, thereby maintaining accuracy while dramatically improving manufacturing throughput and productivity.
Solution Approach 2:
The single mask plate is designed in advance to contain all necessary pattern definitions for multiple components. This preliminary design allows all patterning information to be transferred in one go, eliminating the need for repeated mask alignment and multiple exposure cycles, thus improving efficiency without compromising pattern accuracy.
3Reliability
If multiple masking steps are used, then the reliability of pattern formation is improved, but the loss of time increases
Solution Approach 1:
The invention consolidates multiple patterning operations into a single reliable process step. By performing all pattern formations simultaneously through one masking and etching operation, it reduces the cumulative variability and potential for error that would arise from multiple sequential steps, thereby maintaining reliability while minimizing the total time required.
Solution Approach 2:
The single masking process enables continuous pattern formation without interruption or repositioning. The useful action of pattern transfer is performed continuously in one operation rather than being fragmented into multiple discrete steps, reducing idle time and maintaining consistent process conditions throughout, which improves both reliability and speed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the number of masking steps needed, simplifying the manufacturing process for OLED array substrates and enhancing the efficiency of forming the necessary patterns, thereby improving the overall production efficiency.
Implementation Method 1
performing an exposure treatment on the first photoresist by use of a first mask plate of halftone or gray tones, so that the first photoresist forms a completely-removed region of the first photoresist, a completely-maintained region of the first photoresist and a half-maintained region of the first photoresist
Implementation Method 2
forming a composite conductive film of aluminum neodymium alloy and indium tin oxide for the electrodes
Data Source
AI summary
A method for manufacturing an array substrate comprises forming a pattern including an active layer, a gate insulating layer and a gate on a base substrate, and forming a pattern including an interlayer dielectric layer, a source, a drain and a pixel electrode through a single patterning process on the base substrate formed with the pattern of the active layer, the gate insulating layer and the gate. An array substrate and a display device are further provided.