OLED Pixel Dummy Pattern Layout for Etchant Residue Removal
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Solution Overview
Problem
Existing display device manufacturing processes face challenges in ensuring complete removal of etchant residues during the formation of organic light emitting elements, leading to potential defects and failures such as icicle or fence shape formations that can affect light emission and electrode connectivity.
Innovation Solution
Incorporating a dummy pattern in the non-emission region between pixels, which extends along the direction of one pixel, to guide and remove etchant residues effectively, thereby preventing defects like icicle or fence shape formations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If etchant is used to remove sacrificial layer in non-emission region, then sacrificial layer removal is achieved, but etchant residues remain causing defects
Solution Approach 1:
A dummy pattern is introduced as an intermediary structure in the non-emission region. This dummy pattern serves as a mediator that facilitates complete etchant removal by providing a pathway or collection area for etchant residues, preventing them from contaminating the emission region and causing defects like icicle or fence shape formations.
Solution Approach 2:
The dummy pattern converts the potentially harmful accumulation of etchant residues into a beneficial outcome. By deliberately providing a designated area (the dummy pattern) where etchant residues can accumulate, the harmful effect of residue accumulation is redirected away from the critical emission region, thereby preventing defects while maintaining manufacturing efficiency.
2Reliability
If dummy pattern is added in non-emission region, then etchant residue removal is improved, but device structure becomes more complex
Solution Approach 1:
The dummy pattern is localized exclusively to the non-emission region, leaving the emission region and its critical structures unchanged. This local modification approach improves reliability by addressing etchant residue issues only where they occur, without adding complexity to the functional light-emitting portions of the device.
Solution Approach 2:
The dummy pattern acts as a disposable or sacrificial structure that serves its purpose during manufacturing (collecting/removing etchant residues) and then becomes part of the final encapsulated structure. It performs its function temporarily during the manufacturing process and is subsequently covered by encapsulation layers, effectively making it a temporary solution that resolves itself.
3Ease of manufacture
If dummy pattern extends along pixel direction, then etchant flow guidance is improved, but manufacturing process becomes more complex
Solution Approach 1:
The dummy pattern is segmented to extend along the pixel direction in the non-emission region, creating a directional structure that guides etchant flow. This segmentation approach divides the non-emission region into zones that control etchant movement, improving flow guidance without requiring complex three-dimensional structures or multiple patterning steps.
Solution Approach 2:
Instead of trying to prevent etchant accumulation through complex barrier structures, the invention inverts the approach by deliberately creating a dummy pattern that channels and collects etchant residues in a controlled manner. This inverted thinking simplifies the manufacturing process by working with the etchant flow rather than against it.
Data Source
AI summary
A display device includes a substrate with a display region and a non-display region. The display region includes first pixels, second pixels, and third pixels. Each of the first to third pixels have emission regions from which light is to be emitted, a light emitting element in the emission region, and a pixel circuit area to drive the light emitting element. A dummy pattern extends through a non-emission region of the substrate located in the display region between adjacent pixels. A thin film encapsulation layer covers the dummy pattern and each of the emission regions.


