Photoresist Patterning for High-Resolution OLED Pixel Definition

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Solution Overview

Problem

Existing methods for manufacturing light-emitting display devices face challenges in forming high-resolution displays with accurate color separation between adjacent pixels, leading to potential color mixing and reduced display quality due to the flow of light-emitting solutions during the formation of hole injection, hole transport, and light-emitting layers.

Innovation Solution

A method involving the use of photoresist patterns and a lift-off process to precisely form and remove layers on specific pixel areas, combined with tilting the substrate to control solution distribution and prevent unwanted layer formation on adjacent pixels, ensuring accurate color separation and high-resolution display.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If light-emitting solution is applied to form layers on pixels, then the light-emitting layers are formed, but the solution flows to adjacent pixels causing color mixing

Engineering Contradiction:
Improvecolor separation accuracyVSAvoidcolor mixing
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

A photoresist pattern is formed on the substrate before applying the light-emitting solution. This photoresist pattern serves as a protective layer that prevents the solution from flowing onto adjacent pixels, thereby preventing color mixing while allowing the light-emitting layers to be formed on the intended pixels

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The photoresist pattern acts as an intermediary protective layer between the light-emitting solution and the adjacent pixels. It selectively allows the solution to be applied only to the desired pixel areas while blocking the solution from reaching adjacent pixels, thus preventing color mixing

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If photoresist pattern is used to prevent solution flow, then color mixing is prevented, but the manufacturing process becomes more complex

Engineering Contradiction:
Improvepixel accuracyVSAvoidprocess complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The photoresist pattern is formed using a printing method that automatically defines the pixel boundaries and protects adjacent pixels during the light-emitting layer formation process. The pattern serves multiple functions: it acts as a mask during solution application and is subsequently removed through a lift-off process, integrating protection and patterning in a single systematic approach

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances display quality by preventing color mixing and enabling the production of high-resolution light-emitting display devices with improved pixel accuracy and color separation.

Implementation Method 1

The removing of the first photoresist pattern may be performed using a lift-off process.

Methodology Applied
Scientific EffectLift-off process:

Implementation Method 2

The forming of the light-emitting layer may include ejecting a light-emitting solution onto the first electrode of each of the first pixels and then drying the ejected light-emitting solution

Methodology Applied
Scientific EffectEvaporation: Evaporation

Implementation Method 3

The forming of the light-emitting layer may include ejecting a light-emitting solution onto the first electrodes of some of the first pixels and tilting the substrate to cause the light-emitting solution to flow onto the first electrode of other ones of the first pixels

Methodology Applied
Scientific EffectGravity-driven flow: Gravitation

Data Source

PatentUS9929380B2Method of manufacturing light-emitting display device
Publication Date: 2018.03.27 SAMSUNG DISPLAY CO LTD
  • US9929380B2 patent drawing
  • US9929380B2 patent drawing
  • US9929380B2 patent drawing

AI summary

Provided is a method of manufacturing a light-emitting display device. The method of manufacturing a light-emitting display device may comprise: forming a first electrode on a substrate, the substrate having a plurality of first pixel areas and a plurality of second pixel areas, the first electrode being formed in each of the first and second pixel areas such that corresponding first and second pixels are formed; forming a pixel defining layer on the substrate, the pixel defining layer having an opening exposing the first electrode of each of the first and second pixels; forming a first photoresist pattern on the pixel defining layer, the first photoresist pattern having a first pattern opening exposing the first electrode of each of the first pixels; forming a light-emitting layer on the first electrode exposed through the first pattern opening; and removing the first photoresist pattern.