OLED Touch Display Fabrication via Dry Etching
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Solution Overview
Problem
The existing methods for fabricating OLED touch display screens face challenges such as the need for multiple mask processes, which can damage the source-drain electrode layer and require wet etching that exposes the OLED layer, making it difficult to achieve high-resolution, flexible, and thin displays.
Innovation Solution
A method involving dry etching of both insulating layers to create contact holes of different depths in a single process, using specific etching gases to protect the source-drain electrode layer and reduce OLED exposure, thereby simplifying the production process and preventing oxidation or damage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple mask processes are used to etch insulating layers at different depths, then contact holes of different depths can be formed, but the source-drain electrode layer is damaged or oxidized and electrical properties are reduced
Solution Approach 1:
The patent applies preliminary action by forming a protective film on the source-drain electrode layer before the etching process. This protective film is formed in advance to prevent oxidation and damage to the electrode layer during subsequent etching operations, thereby maintaining electrical properties while enabling precise contact hole formation through multiple mask processes
Solution Approach 2:
The patent uses an intermediary substance (protective film) that mediates between the etching process and the source-drain electrode layer. This protective film acts as a barrier that allows the etching process to proceed while preventing direct contact between the etching chemicals and the electrode layer, thus preserving electrical properties
2Productivity
If wet etching process is used to fabricate touch layer, then etching can be performed effectively, but OLED layer is excessively exposed and damaged
Solution Approach 1:
The patent introduces a protective film as an intermediary layer between the wet etching process and the OLED layer. This protective film enables effective wet etching of the touch layer while preventing excessive exposure and damage to the OLED layer below, thus maintaining both etching efficiency and OLED layer integrity
Solution Approach 2:
The patent converts the potentially harmful wet etching process into a beneficial operation by using the protective film to control the etching depth. The wet etching process, which could otherwise damage the OLED layer, is transformed into an effective tool for fabricating the touch layer when properly controlled by the protective film barrier
3Ease of manufacture
If touch sensor is separately fabricated and adhered to OLED, then touch layer can be formed, but overall thickness is increased and lightness is reduced
Solution Approach 1:
The patent merges the touch layer fabrication process with the OLED display manufacturing process. By integrating the touch sensor fabrication into the same production line and using the same substrate and protective films, the touch layer is formed as part of the OLED structure rather than as a separate component, thereby reducing overall thickness and weight while maintaining ease of manufacture
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the complexity of the production process, enhances device capacity, and protects the source-drain electrode layer from over-etching or oxidation, resulting in improved performance and reduced erosion of the OLED layer.
Implementation Method 1
a dry etching process is performed on the first insulating layer and the second insulating layer
Implementation Method 2
an OLED light emitting layer is formed on the TFT layer
Implementation Method 3
organic light-emitting diode (OLED) displays have many advantages, such as being light in weight, being thin, active emitting
Data Source
AI summary
A method of fabricating an organic light-emitting diode (OLED) touch display screen is provided and has steps of forming a thin film transistor (TFT) layer, an OLED layer, and a touch layer on a base substrate sequentially. Compared with prior art, upon fabricating a touch layer, a first insulating layer is not etched after depositing the first insulating layer and before depositing a bridging point layer. After depositing and forming a second insulating layer, the first and second insulating layers are dry-etched together using combination of two etching gases to achieve fabricating two different depths contact holes in the touch layer in a same process, which effectively reduces erosion of the OLED by a wet-etching process, simplifies a producing process, improves device-producing capacity, and simultaneously achieves a pre-protection effect on touch lines and bonding pads in a source-drain electrode layer to avoid functional failure caused by over-etching or oxidation.