Optical Member Etching via Alternating Dry and Wet Processes
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Solution Overview
Problem
Existing methods for manufacturing optical members with high aspect ratios on light emitting elements face challenges in achieving high shape accuracy due to residue layers formed during dry etching, which inhibit further processing and reduce efficiency.
Innovation Solution
A method involving alternating dry etching and wet etching processes using a mask pattern with oxygen and indium on a glass member, where fluorine-based etching gases and solutions are used to remove residue layers and control etching depths, allowing for the formation of columnar structures with high aspect ratios and improved shape accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Length of stationary object
If dry etching is performed on the glass member, then the etching depth and aspect ratio are improved, but residue layers are formed on the surface reducing shape accuracy
Solution Approach 1:
The etching process is segmented into multiple alternating stages of dry etching and wet etching. Dry etching stages create the desired depth and aspect ratio, while wet etching stages remove the residue layers formed during dry etching. This segmentation allows each process to optimize for its specific function without compromising the other.
Solution Approach 2:
The residue layers formed during dry etching, which were previously considered harmful, are converted into a manageable intermediate state. The wet etching process selectively removes these residue layers while preserving the etched structures, transforming the harmful residue into a temporary byproduct that facilitates the overall manufacturing goal of high aspect ratio with high shape accuracy.
2Manufacturing precision
If multiple etching stages are performed to remove residue layers, then shape accuracy is improved, but manufacturing time increases
Solution Approach 1:
The manufacturing process employs periodic alternation between dry etching and wet etching stages. This periodic action allows for controlled removal of residue layers at optimal intervals, maintaining shape accuracy while preventing excessive accumulation of residues that would require more extensive removal processes later.
Solution Approach 2:
Each wet etching stage performs partial removal of residue layers, removing only the amount necessary to prepare for the next dry etching stage. This partial action approach avoids over-etching and minimizes the total number of stages required, optimizing the balance between shape accuracy and manufacturing time.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enhances the productivity and shape accuracy of optical members by efficiently removing residue layers, enabling the formation of structures with high aspect ratios on light emitting elements, thereby improving light distribution characteristics.
Implementation Method 1
performing dry etching on the glass member using the mask pattern as a mask, the dry etching using an etching gas including fluorine
Implementation Method 2
performing wet etching on the glass member using the mask pattern as a mask, the wet etching using an etching solution including fluorine
Data Source
AI summary
A method for manufacturing an optical member includes: forming a mask pattern on a glass member, the mask pattern comprising oxygen and indium; performing dry etching on the glass member using the mask pattern as a mask, while using an etching gas comprising fluorine; after performing the dry etching, performing wet etching on the glass member using the mask pattern as a mask, while using an etching solution comprising fluorine; and after alternately repeating performing the dry etching and the wet etching a plurality of times, removing the mask pattern.